Mass transport characteristics in a pulsed plasma enhanced chemical vapor deposition reactor for thin polymer film deposition

K.O. Goyal; R. Mahalingam; P.D. Pedrow; M.A. Osman

doi:10.1109/27.912940

Mass transport characteristics in a pulsed plasma enhanced chemical vapor deposition reactor for thin polymer film deposition

IEEE Transactions on Plasma Science ◽

10.1109/27.912940 ◽

2001 ◽

Vol 29 (1) ◽

pp. 42-50 ◽

Cited By ~ 6

Author(s):

K.O. Goyal ◽

R. Mahalingam ◽

P.D. Pedrow ◽

M.A. Osman

Keyword(s):

Chemical Vapor Deposition ◽

Mass Transport ◽

Polymer Film ◽

Vapor Deposition ◽

Chemical Vapor ◽

Film Deposition ◽

Thin Polymer Film ◽

Pulsed Plasma ◽

Chemical Vapor Deposition Reactor ◽

Thin Polymer

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Influence of pulse power amplitude on plasma properties and film deposition in high power pulsed plasma enhanced chemical vapor deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.4867442 ◽

2014 ◽

Vol 32 (3) ◽

pp. 030602 ◽

Cited By ~ 4

Author(s):

Daniel Lundin ◽

Jens Jensen ◽

Henrik Pedersen

Keyword(s):

Chemical Vapor Deposition ◽

High Power ◽

Vapor Deposition ◽

Chemical Vapor ◽

Film Deposition ◽

Pulse Power ◽

Pulsed Plasma ◽

Plasma Properties

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Analysis of a Pulsed‐Plasma Chemical Vapor Deposition Reactor with Recycle

Journal of The Electrochemical Society ◽

10.1149/1.2086893 ◽

1990 ◽

Vol 137 (7) ◽

pp. 2103-2116 ◽

Cited By ~ 19

Author(s):

Sang‐Kyu Park ◽

Demetre J. Economou

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Pulsed Plasma ◽

Plasma Chemical ◽

Chemical Vapor Deposition Reactor ◽

Plasma Chemical Vapor Deposition

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Effects of CCl4 concentration on nanocrystalline diamond film deposition in a hot-filament chemical vapor deposition reactor

Carbon ◽

10.1016/j.carbon.2004.04.032 ◽

2004 ◽

Vol 42 (11) ◽

pp. 2201-2205 ◽

Cited By ~ 7

Author(s):

Chen-Hao Ku ◽

Jih-Jen Wu

Keyword(s):

Chemical Vapor Deposition ◽

Diamond Film ◽

Vapor Deposition ◽

Chemical Vapor ◽

Film Deposition ◽

Nanocrystalline Diamond ◽

Chemical Vapor Deposition Reactor ◽

Hot Filament

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Optimization of Deposition Parameters for Thin Silicon Films on Flexible Substrates in a Hot-Wire Chemical Vapor Deposition Reactor

Materials Science Forum ◽

10.4028/www.scientific.net/msf.514-516.475 ◽

2006 ◽

Vol 514-516 ◽

pp. 475-482 ◽

Cited By ~ 1

Author(s):

Pedro Alpuim ◽

M. Ribeiro ◽

Sergej Filonovich

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Silicon Films ◽

Flexible Substrates ◽

Hot Wire ◽

Chemical Vapor Deposition Reactor ◽

Deposition Parameters ◽

Thin Silicon

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The Effect of Thermophoresis on Particle Deposition in a Tungsten Low Pressure Chemical Vapor Deposition Reactor

Journal of The Electrochemical Society ◽

10.1149/1.1392026 ◽

1999 ◽

Vol 146 (8) ◽

pp. 2901-2905 ◽

Cited By ~ 4

Author(s):

B. S. MacGibbon ◽

A. A. Busnaina ◽

B. Fardi

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Particle Deposition ◽

Chemical Vapor ◽

Low Pressure ◽

Chemical Vapor Deposition Reactor ◽

Pressure Chemical

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Particle Dynamics in a Chemical Vapor Deposition Reactor: A Multiscale Approach

Industrial & Engineering Chemistry Research ◽

10.1021/ie8015522 ◽

2009 ◽

Vol 48 (13) ◽

pp. 5969-5974 ◽

Cited By ~ 1

Author(s):

Yousef Sharifi ◽

Luke Achenie

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Particle Dynamics ◽

Multiscale Approach ◽

Chemical Vapor Deposition Reactor

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High-quality diamond film deposition on a titanium substrate using the hot-filament chemical vapor deposition method

Diamond and Related Materials ◽

10.1016/j.diamond.2006.12.016 ◽

2007 ◽

Vol 16 (8) ◽

pp. 1530-1540 ◽

Cited By ~ 34

Author(s):

Liang Guo ◽

Guohua Chen

Keyword(s):

Chemical Vapor Deposition ◽

Diamond Film ◽

Vapor Deposition ◽

Titanium Substrate ◽

Chemical Vapor ◽

Film Deposition ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

High Quality ◽

Hot Filament

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Ferroelectric SrBi2Ta2O9 thin film deposition at 550 °C by plasma-enhanced metalorganic chemical vapor deposition onto a metalorganic chemical vapor deposition platinum bottom electrode

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.581554 ◽

1999 ◽

Vol 17 (1) ◽

pp. 83-87 ◽

Cited By ~ 5

Author(s):

Nak-Jin Seong ◽

Eun-Suck Choi ◽

Soon-Gil Yoon

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Bottom Electrode ◽

Chemical Vapor ◽

Thin Film Deposition ◽

Film Deposition ◽

Metalorganic Chemical

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Optimizing the gas phase chemistry in a d.c. arcjet diamond chemical vapor deposition reactor

Thin Solid Films ◽

10.1016/0040-6090(94)90302-6 ◽

1994 ◽

Vol 253 (1-2) ◽

pp. 103-108 ◽

Cited By ~ 4

Author(s):

Scott W. Reeve ◽

Wayne A. Weimer

Keyword(s):

Chemical Vapor Deposition ◽

Gas Phase ◽

Vapor Deposition ◽

Chemical Vapor ◽

Chemical Vapor Deposition Reactor ◽

Gas Phase Chemistry ◽

Phase Chemistry ◽

Diamond Chemical Vapor Deposition

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Formation of Iron Carbide Nanorod by Pulsed Plasma Chemical Vapor Deposition

Journal of Physics Conference Series ◽

10.1088/1742-6596/258/1/012012 ◽

2010 ◽

Vol 258 ◽

pp. 012012

Author(s):

S Yooyen ◽

T Kawamura ◽

S Kotake ◽

Y Suzuki

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Iron Carbide ◽

Chemical Vapor ◽

Pulsed Plasma ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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