Analysis of a Pulsed‐Plasma Chemical Vapor Deposition Reactor with Recycle

Sang‐Kyu Park; Demetre J. Economou

doi:10.1149/1.2086893

Analysis of a Pulsed‐Plasma Chemical Vapor Deposition Reactor with Recycle

Journal of The Electrochemical Society ◽

10.1149/1.2086893 ◽

1990 ◽

Vol 137 (7) ◽

pp. 2103-2116 ◽

Cited By ~ 19

Author(s):

Sang‐Kyu Park ◽

Demetre J. Economou

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Pulsed Plasma ◽

Plasma Chemical ◽

Chemical Vapor Deposition Reactor ◽

Plasma Chemical Vapor Deposition

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Formation of Iron Carbide Nanorod by Pulsed Plasma Chemical Vapor Deposition

Journal of Physics Conference Series ◽

10.1088/1742-6596/258/1/012012 ◽

2010 ◽

Vol 258 ◽

pp. 012012

Author(s):

S Yooyen ◽

T Kawamura ◽

S Kotake ◽

Y Suzuki

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Iron Carbide ◽

Chemical Vapor ◽

Pulsed Plasma ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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Development of cylinderical cavity type microwave plasma chemical vapor deposition reactor for diamond films deposition

2013 Abstracts IEEE International Conference on Plasma Science (ICOPS) ◽

10.1109/plasma.2013.6635167 ◽

2013 ◽

Author(s):

J. Su ◽

Y. Li ◽

Y. Liu ◽

M Ding ◽

W. Tang

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Microwave Plasma ◽

Diamond Films ◽

Chemical Vapor ◽

Plasma Chemical ◽

Chemical Vapor Deposition Reactor ◽

Plasma Chemical Vapor Deposition

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Behavior of downstream plasmas generated in a microwave plasma chemical‐vapor deposition reactor

Journal of Applied Physics ◽

10.1063/1.342467 ◽

1988 ◽

Vol 64 (9) ◽

pp. 4398-4403 ◽

Cited By ~ 10

Author(s):

P. K. Shufflebotham ◽

D. J. Thomson ◽

H. C. Card

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Plasma Chemical ◽

Chemical Vapor Deposition Reactor ◽

Plasma Chemical Vapor Deposition

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Behavior of charged particles in an electron cyclotron resonance plasma chemical vapor deposition reactor

Applied Physics Letters ◽

10.1063/1.103892 ◽

1990 ◽

Vol 57 (22) ◽

pp. 2297-2299 ◽

Cited By ~ 4

Author(s):

Yoshikazu Nakayama ◽

Mitsuru Kondoh ◽

Kohji Hitsuishi ◽

Mei Zhang ◽

Takao Kawamura

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Charged Particles ◽

Chemical Vapor ◽

Plasma Chemical ◽

Chemical Vapor Deposition Reactor ◽

Plasma Chemical Vapor Deposition ◽

Resonance Plasma

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Discharge Instability at Patterned Conductive Layers on Insulating Substrates during Pulsed-Plasma Chemical Vapor Deposition under Near Atmospheric Pressures

e-Journal of Surface Science and Nanotechnology ◽

10.1380/ejssnt.2013.47 ◽

2013 ◽

Vol 11 (0) ◽

pp. 47-52

Author(s):

Yohei Inayoshi ◽

Hirokazu Fukidome ◽

Setsuo Nakajima ◽

Tsuyoshi Uehara ◽

Yasutake Toyoshima ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Pulsed Plasma ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Insulating Substrates

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A 915 MHz/75 kW cylindrical cavity type microwave plasma chemical vapor deposition reactor with a ladder-shaped circumferential antenna developed for growing large area diamond films

Diamond and Related Materials ◽

10.1016/j.diamond.2017.08.007 ◽

2017 ◽

Vol 78 ◽

pp. 67-72 ◽

Cited By ~ 7

Author(s):

Y.F. Li ◽

X.M. An ◽

X.C. Liu ◽

L. Jiang ◽

P.W. Zhang ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cylindrical Cavity ◽

Microwave Plasma ◽

Diamond Films ◽

Chemical Vapor ◽

Large Area ◽

Plasma Chemical ◽

Chemical Vapor Deposition Reactor ◽

Plasma Chemical Vapor Deposition

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Numerical analysis of a mixture of Ar/NH3 microwave plasma chemical vapor deposition reactor

Journal of Applied Physics ◽

10.1063/1.4728210 ◽

2012 ◽

Vol 111 (11) ◽

pp. 113304 ◽

Cited By ~ 4

Author(s):

Zhi Li ◽

Zhen Zhao ◽

Xuehui Li

Keyword(s):

Chemical Vapor Deposition ◽

Numerical Analysis ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Plasma Chemical ◽

Chemical Vapor Deposition Reactor ◽

Plasma Chemical Vapor Deposition

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Silicon carbon nitride cones prepared from an ellipsoid microwave plasma chemical vapor deposition reactor

Materials Letters ◽

10.1016/j.matlet.2004.06.050 ◽

2004 ◽

Vol 58 (27-28) ◽

pp. 3467-3469 ◽

Cited By ~ 4

Author(s):

W.J. Cheng ◽

J.C. Jiang ◽

Y. Zhang ◽

H.S. Zhu ◽

D.Z. Shen

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Carbon Nitride ◽

Microwave Plasma ◽

Chemical Vapor ◽

Plasma Chemical ◽

Chemical Vapor Deposition Reactor ◽

Plasma Chemical Vapor Deposition ◽

Silicon Carbon ◽

Silicon Carbon Nitride

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Lift-off process with bi-layer photoresist patterns for conformal-coated superhydrophilic pulsed plasma chemical vapor deposition-SiOxon SiCxfor lab-on-a-chip applications

Japanese Journal of Applied Physics ◽

10.7567/jjap.54.047201 ◽

2015 ◽

Vol 54 (4) ◽

pp. 047201 ◽

Cited By ~ 3

Author(s):

Satoshi Konishi ◽

Chise Nakagami ◽

Taizo Kobayashi ◽

Wataru Tonomura ◽

Yoshihiro Kaizuma

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Lab On A Chip ◽

Pulsed Plasma ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Lift Off

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Formation of Graphene-Containing Porous Carbon Film for Electric Double-Layer Capacitor by Pulsed Plasma Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.7567/jjap.51.045103 ◽

2012 ◽

Vol 51 (4R) ◽

pp. 045103 ◽

Cited By ~ 3

Author(s):

Masahiro Matsushima ◽

Mikio Noda ◽

Golap Kalita ◽

Hideo Uchida ◽

Koichi Wakita ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Electric Double Layer ◽

Carbon Film ◽

Chemical Vapor ◽

Electric Double Layer Capacitor ◽

Pulsed Plasma ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Double Layer Capacitor

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