X-ray reflectivity measurement of δ-doped erbium profile in silicon molecular-beam epitaxial layer

1999 ◽  
Vol 59 (16) ◽  
pp. 10697-10700 ◽  
Author(s):  
Jun Wan ◽  
Z. M. Jiang ◽  
D. W. Gong ◽  
Y. L. Fan ◽  
C. Sheng ◽  
...  
2012 ◽  
Vol 1396 ◽  
Author(s):  
Mohana K. Rajpalke ◽  
Thirumaleshwara N. Bhat ◽  
Basanta Roul ◽  
Mahesh Kumar ◽  
S. B. Krupanidhi

ABSTRACTNonpolar a-plane InN/GaN heterostructures were grown by plasma assisted molecular beam epitaxy. The growth of nonpolar a- plane InN / GaN heterostructures were confirmed by high resolution x-ray diffraction study. Reflection high energy electron diffraction patterns show the reasonably smooth surface of a-plane GaN and island-like growth for nonpolar a-plane InN film, which is further confirmed by scanning electron micrographs. An absorption edge in the optical spectra has the energy of 0.74 eV, showing blueshifts from the fundamental band gap of 0.7 eV. The rectifying behavior of the I-V curve indicates the existence of Schottky barrier at the InN and GaN interface. The Schottky barrier height (φb) and the ideality factor (η) for the InN/GaN heterostructures found to be 0.58 eV and 2.05 respectively.


1994 ◽  
Vol 33 (Part 2, No. 8A) ◽  
pp. L1059-L1062 ◽  
Author(s):  
Tamotsu Okamoto ◽  
Toshihiko Miyashita ◽  
Akira Yamada ◽  
Makoto Konagai ◽  
Kiyoshi Takahashi

APL Materials ◽  
2020 ◽  
Vol 8 (10) ◽  
pp. 101107
Author(s):  
Xi Yan ◽  
Friederike Wrobel ◽  
Yan Li ◽  
Hua Zhou ◽  
Huan-hua Wang ◽  
...  

1999 ◽  
Vol 74 (20) ◽  
pp. 2981-2983 ◽  
Author(s):  
J. H. Li ◽  
H. Chen ◽  
L. C. Cai ◽  
S. F. Cui ◽  
W. X. Yu ◽  
...  

AIP Advances ◽  
2016 ◽  
Vol 6 (3) ◽  
pp. 035303 ◽  
Author(s):  
Hidetoshi Suzuki ◽  
Yuka Nakata ◽  
Masamitu Takahasi ◽  
Kazuma Ikeda ◽  
Yoshio Ohshita ◽  
...  

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