Broadband microwave absorption and standing wave effect in helium capacitively coupled plasma

Yachun Zhang; Xiang He; Jianping Chen; Li Chen; Hongchao Zhang; Xiaowu Ni; Jian Lu; Zhonghua Shen

doi:10.1063/1.4997614

Broadband microwave absorption and standing wave effect in helium capacitively coupled plasma

Physics of Plasmas ◽

10.1063/1.4997614 ◽

2017 ◽

Vol 24 (8) ◽

pp. 083511 ◽

Cited By ~ 4

Author(s):

Yachun Zhang ◽

Xiang He ◽

Jianping Chen ◽

Li Chen ◽

Hongchao Zhang ◽

...

Keyword(s):

Microwave Absorption ◽

Standing Wave ◽

Wave Effect ◽

Capacitively Coupled ◽

Capacitively Coupled Plasma

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Observation of the standing wave effect in large-area, very-high-frequency capacitively coupled plasmas by using a fiber Bragg grating sensor

Journal of Applied Physics ◽

10.1063/1.5024835 ◽

2018 ◽

Vol 123 (22) ◽

pp. 223304 ◽

Cited By ~ 1

Author(s):

Dao-Man Han ◽

Yong-Xin Liu ◽

Fei Gao ◽

Xiang-Yu Wang ◽

Ang Li ◽

...

Keyword(s):

Fiber Bragg Grating ◽

Standing Wave ◽

High Frequency ◽

Large Area ◽

Very High Frequency ◽

Wave Effect ◽

Capacitively Coupled ◽

Coupled Plasmas ◽

Bragg Grating Sensor ◽

Very High

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Calculation of the electrode shape for suppression of the standing wave effect in large area rectangular capacitively coupled reactors

Journal of Applied Physics ◽

10.1063/1.1862770 ◽

2005 ◽

Vol 97 (6) ◽

pp. 063304 ◽

Cited By ~ 19

Author(s):

L. Sansonnens

Keyword(s):

Standing Wave ◽

Large Area ◽

Wave Effect ◽

Capacitively Coupled ◽

Electrode Shape ◽

Coupled Reactors

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Experimental investigation of standing wave effect in dual-frequency capacitively coupled argon discharges: role of a low-frequency source

Plasma Sources Science and Technology ◽

10.1088/1361-6595/aac242 ◽

2018 ◽

Vol 27 (5) ◽

pp. 055017 ◽

Cited By ~ 6

Author(s):

Kai Zhao ◽

Yong-Xin Liu ◽

E Kawamura ◽

De-Qi Wen ◽

M A Lieberman ◽

...

Keyword(s):

Experimental Investigation ◽

Standing Wave ◽

Low Frequency ◽

Dual Frequency ◽

Wave Effect ◽

Capacitively Coupled ◽

Frequency Source

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Application of the shaped electrode technique to a large area rectangular capacitively coupled plasma reactor to suppress standing wave nonuniformity

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.2189266 ◽

2006 ◽

Vol 24 (4) ◽

pp. 1425-1430 ◽

Cited By ~ 20

Author(s):

L. Sansonnens ◽

H. Schmidt ◽

A. A. Howling ◽

Ch. Hollenstein ◽

Ch. Ellert ◽

...

Keyword(s):

Standing Wave ◽

Plasma Reactor ◽

Large Area ◽

Capacitively Coupled ◽

Capacitively Coupled Plasma ◽

Electrode Technique

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Dust transport phenomena in a capacitively coupled plasma reactor

Journal of Applied Physics ◽

10.1063/1.1285843 ◽

2001 ◽

Vol 89 (1) ◽

pp. 34-41 ◽

Cited By ~ 4

Author(s):

Heon Chang Kim ◽

Vasilios I. Manousiouthakis

Keyword(s):

Plasma Reactor ◽

Transport Phenomena ◽

Capacitively Coupled ◽

Dust Transport ◽

Capacitively Coupled Plasma

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Functional separation of biasing and sustaining voltages in two-frequency capacitively coupled plasma

Applied Physics Letters ◽

10.1063/1.127020 ◽

2000 ◽

Vol 77 (4) ◽

pp. 489-491 ◽

Cited By ~ 187

Author(s):

T. Kitajima ◽

Y. Takeo ◽

Z. Lj. Petrović ◽

T. Makabe

Keyword(s):

Capacitively Coupled ◽

Capacitively Coupled Plasma

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1-D Fluid Modeling of Methane Dissociation in Radiofrequency Capacitively Coupled Plasma

Renewable Energy for Smart and Sustainable Cities - Lecture Notes in Networks and Systems ◽

10.1007/978-3-030-04789-4_55 ◽

2018 ◽

pp. 516-522

Author(s):

Abdelatif Gadoum ◽

Djilali Benyoucef ◽

Mohamed Habib Allah Lahoual

Keyword(s):

Capacitively Coupled ◽

Fluid Modeling ◽

Capacitively Coupled Plasma ◽

Methane Dissociation

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Simulation of cold plasma in a chamber under high- and low-frequency voltage conditions for a capacitively coupled plasma

Journal of Semiconductors ◽

10.1088/1674-4926/33/10/104004 ◽

2012 ◽

Vol 33 (10) ◽

pp. 104004 ◽

Cited By ~ 1

Author(s):

Daoxin Hao ◽

Jia Cheng ◽

Linhong Ji ◽

Yuchun Sun

Keyword(s):

Cold Plasma ◽

Low Frequency ◽

Capacitively Coupled ◽

Capacitively Coupled Plasma

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Prediction of a Radial Variation of Plasma Structure and Ion Distributions in the Wafer Interface in Two-Frequency Capacitively Coupled Plasma

IEEE Transactions on Plasma Science ◽

10.1109/tps.2004.823968 ◽

2004 ◽

Vol 32 (1) ◽

pp. 90-100 ◽

Cited By ~ 28

Author(s):

T. Yagisawa ◽

K. Maeshige ◽

T. Shimada ◽

T. Makabe

Keyword(s):

Radial Variation ◽

Plasma Structure ◽

Capacitively Coupled ◽

Ion Distributions ◽

Capacitively Coupled Plasma

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Modeling of Perpendicularly Driven Dual-Frequency Capacitively Coupled Plasma

Plasma Science and Technology ◽

10.1088/1009-0630/18/2/08 ◽

2016 ◽

Vol 18 (2) ◽

pp. 143-146

Author(s):

Hongyu Wang ◽

Wei Jiang ◽

Peng Sun ◽

Shuangyun Zhao ◽

Yang Li

Keyword(s):

Dual Frequency ◽

Capacitively Coupled ◽

Capacitively Coupled Plasma

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