scholarly journals Direct fabrication of thin layer MoS2 field-effect nanoscale transistors by oxidation scanning probe lithography

2015 ◽  
Vol 106 (10) ◽  
pp. 103503 ◽  
Author(s):  
Francisco M. Espinosa ◽  
Yu K. Ryu ◽  
Kolyo Marinov ◽  
Dumitru Dumcenco ◽  
Andras Kis ◽  
...  
Keyword(s):  
Thin Layer ◽  
Field Effect ◽  
Scanning Probe ◽  
Scanning Probe Lithography ◽  
Direct Fabrication ◽  
Nanoscale Transistors

scholarly journals Nanofabrication of graphene field-effect transistors by thermal scanning probe lithography

APL Materials ◽  
2021 ◽  
Vol 9 (1) ◽  
pp. 011107
Author(s):  
Xiangyu Liu ◽  
Zhujun Huang ◽  
Xiaorui Zheng ◽  
Davood Shahrjerdi ◽  
Elisa Riedo
Keyword(s):  
Field Effect ◽  
Field Effect Transistors ◽  
Scanning Probe ◽  
Scanning Probe Lithography

scholarly journals Sub-20 nm patterning of thin layer WSe2 by scanning probe lithography

2016 ◽  
Vol 109 (16) ◽  
pp. 163103 ◽  
Author(s):  
Arancha I. Dago ◽  
Yu K. Ryu ◽  
Ricardo Garcia
Keyword(s):  
Thin Layer ◽  
Scanning Probe ◽  
Scanning Probe Lithography ◽  
20 Nm

Investigations on the positioning accuracy of the Nano Fabrication Machine (NFM-100)

2021 ◽  
Vol 0 (0) ◽  
Author(s):  
Jaqueline Stauffenberg ◽  
Ingo Ortlepp ◽  
Ulrike Blumröder ◽  
Denis Dontsov ◽  
Christoph Schäffel ◽  
...  
Keyword(s):  
Target Position ◽  
Repeated Measurements ◽  
Scanning Probe ◽  
Measuring System ◽  
Direct Drive ◽  
Positioning Accuracy ◽  
Scanning Probe Lithography ◽  
Nano Fabrication ◽  
Atomic Force ◽  
Acceleration And Deceleration

Abstract This contribution deals with the analysis of the positioning accuracy of a new Nano Fabrication Machine. This machine uses a planar direct drive system and has a positioning range up to 100 mm in diameter. The positioning accuracy was investigated in different movement scenarios, including phases of acceleration and deceleration. Also, the target position error of certain movements at different positions of the machine slider is considered. Currently, the NFM-100 is equipped with a tip-based measuring system. This Atomic Force Microscope (AFM) uses self-actuating and self-sensing microcantilevers, which can be used also for Field-Emission-Scanning-Probe-Lithography (FESPL). This process is capable of fabricating structures in the range of nanometres. In combination with the NFM-100 and its positioning range, nanostructures can be analysed and written in a macroscopic range without any tool change. However, the focus in this article is on the measurement and positioning accuracy of the tip-based measuring system in combination with the NFM-100 and is verified by repeated measurements. Finally, a linescan, realised using both systems, is shown over a long range of motion of 30 mm.

Scanning probe lithography tips with spring-on-tip designs: Analysis, fabrication, and testing

2005 ◽  
Vol 87 (5) ◽  
pp. 054102 ◽  
Author(s):  
Xuefeng Wang ◽  
Loren Vincent ◽  
David Bullen ◽  
Jun Zou ◽  
Chang Liu
Keyword(s):  
Scanning Probe ◽  
Scanning Probe Lithography

“Multipoint Force Feedback” Leveling of Massively Parallel Tip Arrays in Scanning Probe Lithography

Small ◽  
2015 ◽  
Vol 11 (35) ◽  
pp. 4526-4531 ◽  
Author(s):  
Hanaul Noh ◽  
Goo-Eun Jung ◽  
Sukhyun Kim ◽  
Seong-Hun Yun ◽  
Ahjin Jo ◽  
...  
Keyword(s):  
Force Feedback ◽  
Scanning Probe ◽  
Massively Parallel ◽  
Scanning Probe Lithography

scholarly journals Subwavelength Nanostructuring of Gold Films by Apertureless Scanning Probe Lithography Assisted by a Femtosecond Fiber Laser Oscillator

Nanomaterials ◽  
2018 ◽  
Vol 8 (7) ◽  
pp. 536 ◽  
Author(s):  
Ignacio Falcón Casas ◽  
Wolfgang Kautek
Keyword(s):  
Fiber Laser ◽  
Near Field ◽  
Diffraction Limit ◽  
High Repetition Rate ◽  
Scanning Probe ◽  
Optical Methods ◽  
Laser Source ◽  
Gold Films ◽  
Laser Oscillator ◽  
Scanning Probe Lithography

Optical methods in nanolithography have been traditionally limited by Abbe’s diffraction limit. One method able to overcome this barrier is apertureless scanning probe lithography assisted by laser. This technique has demonstrated surface nanostructuring below the diffraction limit. In this study, we demonstrate how a femtosecond Yb-doped fiber laser oscillator running at high repetition rate of 46 MHz and a pulse duration of 150 fs can serve as the laser source for near-field nanolithography. Subwavelength features were generated on the surface of gold films down to a linewidth of 10 nm. The near-field enhancement in this apertureless scanning probe lithography setup could be determined experimentally for the first time. Simulations were in good agreement with the experiments. This result supports near-field tip-enhancement as the major physical mechanisms responsible for the nanostructuring.

Characteristics of scanning-probe lithography with a current-controlled exposure system

1998 ◽  
Vol 72 (13) ◽  
pp. 1581-1583 ◽  
Author(s):  
Masayoshi Ishibashi ◽  
Seiji Heike ◽  
Hiroshi Kajiyama ◽  
Yasuo Wada ◽  
Tomihiro Hashizume
Keyword(s):  
Scanning Probe ◽  
Exposure System ◽  
Scanning Probe Lithography ◽  
Controlled Exposure ◽  
A Current

Field-emission scanning probe lithography tool for 150 mm wafer

2018 ◽  
Vol 36 (6) ◽  
pp. 06JL06 ◽  
Author(s):  
Mathias Holz ◽  
Elshad Guliyev ◽  
Ahmad Ahmad ◽  
Tzvetan Ivanov ◽  
Alexander Reum ◽  
...  
Keyword(s):  
Field Emission ◽  
Scanning Probe ◽  
Scanning Probe Lithography
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