Structural characterization of rapid thermal oxidized Si1−x−yGexCy alloy films grown by rapid thermal chemical vapor deposition

W. K. Choi; J. H. Chen; L. K. Bera; W. Feng; K. L. Pey; J. Mi; C. Y. Yang; A. Ramam; S. J. Chua; J. S. Pan; A. T. S. Wee; R. Liu

doi:10.1063/1.371843

Structural characterization of rapid thermal oxidized Si1−x−yGexCy alloy films grown by rapid thermal chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.371843 ◽

2000 ◽

Vol 87 (1) ◽

pp. 192-197 ◽

Cited By ~ 11

Author(s):

W. K. Choi ◽

J. H. Chen ◽

L. K. Bera ◽

W. Feng ◽

K. L. Pey ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Structural Characterization ◽

Vapor Deposition ◽

Chemical Vapor ◽

Alloy Films ◽

Thermal Chemical Vapor Deposition

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Surface characterization of mesoporous biomass activated carbon modified by thermal chemical vapor deposition and adsorptive mechanism of nitrate ions in aqueous solution

Colloids and Surfaces A Physicochemical and Engineering Aspects ◽

10.1016/j.colsurfa.2021.126213 ◽

2021 ◽

pp. 126213

Author(s):

Jinghan Yuan ◽

Yoshimasa Amano ◽

Motoi Machida

Keyword(s):

Aqueous Solution ◽

Activated Carbon ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Surface Characterization ◽

Chemical Vapor ◽

Thermal Chemical Vapor Deposition ◽

Nitrate Ions ◽

Adsorptive Mechanism

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ChemInform Abstract: Characterization of Thin Silicon Oxynitride Films Prepared by Low Pressure Rapid Thermal Chemical Vapor Deposition.

ChemInform ◽

10.1002/chin.199406262 ◽

2010 ◽

Vol 25 (6) ◽

pp. no-no

Author(s):

X.-L. XU ◽

P. K. MCLARTY ◽

H. BRUSH ◽

V. MISRA ◽

J. J. WORTMAN ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Low Pressure ◽

Silicon Oxynitride ◽

Thermal Chemical Vapor Deposition ◽

Abstract Characterization ◽

Thin Silicon

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Plasma-enhanced chemical vapor deposition and structural characterization of amorphous chalcogenide films

Semiconductors ◽

10.1134/1.1187472 ◽

1998 ◽

Vol 32 (8) ◽

pp. 855-860 ◽

Cited By ~ 11

Author(s):

P. Nagels

Keyword(s):

Chemical Vapor Deposition ◽

Structural Characterization ◽

Vapor Deposition ◽

Chemical Vapor ◽

Chalcogenide Films ◽

Amorphous Chalcogenide

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Structural characterization of InN films grown on different buffer layers by metalorganic chemical vapor deposition

Journal of Crystal Growth ◽

10.1016/j.jcrysgro.2007.05.052 ◽

2007 ◽

Vol 306 (2) ◽

pp. 292-296 ◽

Cited By ~ 13

Author(s):

X.L. Zhu ◽

L.W. Guo ◽

N.S. Yu ◽

J.F. Yan ◽

M.Z. Peng ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Structural Characterization ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Buffer Layers ◽

Metalorganic Chemical

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Structural characterization of aluminum films deposited on sputtered‐titanium nitride/silicon substrate by metalorganic chemical vapor deposition from dimethylethylamine alane

Applied Physics Letters ◽

10.1063/1.115268 ◽

1995 ◽

Vol 67 (23) ◽

pp. 3426-3428 ◽

Cited By ~ 11

Author(s):

Xiaodong Li ◽

Byoung‐Youp Kim ◽

Shi‐Woo Rhee

Keyword(s):

Chemical Vapor Deposition ◽

Structural Characterization ◽

Vapor Deposition ◽

Silicon Substrate ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Aluminum Films ◽

Dimethylethylamine Alane ◽

Metalorganic Chemical

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Formation and structural characterization of nanocrystalline Si/SiC multilayers grown by hot filament assisted chemical vapor deposition using CH3SiH3 gas jets

Thin Solid Films ◽

10.1016/j.tsf.2009.10.127 ◽

2010 ◽

Vol 518 (14) ◽

pp. 3759-3762 ◽

Cited By ~ 3

Author(s):

Yoshifumi Ikoma ◽

Ryousuke Okuyama ◽

Makoto Arita ◽

Teruaki Motooka

Keyword(s):

Chemical Vapor Deposition ◽

Structural Characterization ◽

Vapor Deposition ◽

Chemical Vapor ◽

Gas Jets ◽

Hot Filament ◽

Nanocrystalline Si

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Structural Characterization of HfNx-based Films Grown by Metal Organic Chemical Vapor Deposition

Metals and Materials International ◽

10.3365/met.mat.2008.02.099 ◽

2008 ◽

Vol 14 (1) ◽

pp. 99-103 ◽

Cited By ~ 1

Author(s):

Chang Chun Chen

Keyword(s):

Chemical Vapor Deposition ◽

Structural Characterization ◽

Vapor Deposition ◽

Chemical Vapor ◽

Organic Chemical ◽

Metal Organic ◽

Organic Chemical Vapor Deposition

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Deposition and structural characterization of poly-Si thin films on Al-coated glass substrates using hot-wire chemical vapor deposition

Thin Solid Films ◽

10.1016/s0040-6090(03)00088-9 ◽

2003 ◽

Vol 430 (1-2) ◽

pp. 120-124 ◽

Cited By ~ 9

Author(s):

Ozgenc Ebil ◽

Roger Aparicio ◽

Sukti Hazra ◽

Robert W. Birkmire ◽

Eli Sutter

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Structural Characterization ◽

Vapor Deposition ◽

Chemical Vapor ◽

Hot Wire ◽

Coated Glass ◽

Glass Substrates

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Growth and characterization of polycrystalline diamond films on silicon using sugarcane bagasse as carbon precursor at atmospheric pressure by thermal chemical vapor deposition

Diamond and Related Materials ◽

10.1016/j.diamond.2018.05.001 ◽

2018 ◽

Vol 87 ◽

pp. 18-26 ◽

Cited By ~ 6

Author(s):

Lucky Krishnia ◽

Pawan K. Tyagi

Keyword(s):

Chemical Vapor Deposition ◽

Sugarcane Bagasse ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Diamond Films ◽

Chemical Vapor ◽

Polycrystalline Diamond ◽

Carbon Precursor ◽

Thermal Chemical Vapor Deposition

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Characterization of Fe-catalyzed carbon nanotubes grown by thermal chemical vapor deposition

Journal of Crystal Growth ◽

10.1016/s0022-0248(02)01661-5 ◽

2002 ◽

Vol 244 (2) ◽

pp. 211-217 ◽

Cited By ~ 49

Author(s):

Jong-Bong Park ◽

Gyu-Seok Choi ◽

Yu-Seok Cho ◽

Sang-Young Hong ◽

Dojin Kim ◽

...

Keyword(s):

Carbon Nanotubes ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Thermal Chemical Vapor Deposition

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