Structural characterization of aluminum films deposited on sputtered‐titanium nitride/silicon substrate by metalorganic chemical vapor deposition from dimethylethylamine alane

Xiaodong Li; Byoung‐Youp Kim; Shi‐Woo Rhee

doi:10.1063/1.115268

Structural characterization of aluminum films deposited on sputtered‐titanium nitride/silicon substrate by metalorganic chemical vapor deposition from dimethylethylamine alane

Applied Physics Letters ◽

10.1063/1.115268 ◽

1995 ◽

Vol 67 (23) ◽

pp. 3426-3428 ◽

Cited By ~ 11

Author(s):

Xiaodong Li ◽

Byoung‐Youp Kim ◽

Shi‐Woo Rhee

Keyword(s):

Chemical Vapor Deposition ◽

Structural Characterization ◽

Vapor Deposition ◽

Silicon Substrate ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Aluminum Films ◽

Dimethylethylamine Alane ◽

Metalorganic Chemical

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Structural characterization of InN films grown on different buffer layers by metalorganic chemical vapor deposition

Journal of Crystal Growth ◽

10.1016/j.jcrysgro.2007.05.052 ◽

2007 ◽

Vol 306 (2) ◽

pp. 292-296 ◽

Cited By ~ 13

Author(s):

X.L. Zhu ◽

L.W. Guo ◽

N.S. Yu ◽

J.F. Yan ◽

M.Z. Peng ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Structural Characterization ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Buffer Layers ◽

Metalorganic Chemical

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Influences of Initial Nitridation Process on the Optical and Structural Characterization of GaN Layer Grown on Sapphire (0001) by Metalorganic Chemical Vapor Deposition

phys stat sol (a) ◽

10.1002/1521-396x(200112)188:2<653::aid-pssa653>3.0.co;2-b ◽

2001 ◽

Vol 188 (2) ◽

pp. 653-657 ◽

Cited By ~ 1

Author(s):

X.L. Sun ◽

Hui Yang ◽

J.J. Zhu ◽

Y.T. Wang ◽

Y. Chen ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Structural Characterization ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Nitridation Process ◽

Metalorganic Chemical

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Characteristics of aluminum films prepared by metalorganic chemical vapor deposition using dimethylethylamine alane on the plasma-pretreated TiN surfaces

Korean Journal of Chemical Engineering ◽

10.1007/bf02706859 ◽

2000 ◽

Vol 17 (4) ◽

pp. 449-454 ◽

Cited By ~ 11

Author(s):

Do-Heyoung Kim ◽

Byung-Yup Kim

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Aluminum Films ◽

Dimethylethylamine Alane ◽

Metalorganic Chemical

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Structural characterization of AlGaN/AlN Bragg reflector grown by metalorganic chemical vapor deposition

physica status solidi (a) ◽

10.1002/pssa.200723051 ◽

2008 ◽

Vol 205 (7) ◽

pp. 1572-1574 ◽

Cited By ~ 7

Author(s):

X. L. Ji ◽

R. L. Jiang ◽

B. Liu ◽

Z. L. Xie ◽

J. J. Zhou ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Structural Characterization ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Bragg Reflector ◽

Metalorganic Chemical

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Structural characterization of ZnO nanopillars grown by atmospheric-pressure metalorganic chemical vapor deposition on vicinal 4H-SiC and SiO2/Si substrates

Journal of Applied Physics ◽

10.1063/1.3549140 ◽

2011 ◽

Vol 109 (4) ◽

pp. 043507-043507-8 ◽

Cited By ~ 6

Author(s):

I. Tsiaoussis ◽

V. Khranovskyy ◽

G. P. Dimitrakopulos ◽

J. Stoemenos ◽

R. Yakimova ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Structural Characterization ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Si Substrates ◽

Metalorganic Chemical

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Structural Characterization of Poly-SiC Grown on SiO2/Si by Metalorganic Chemical Vapor Deposition

Solid State Phenomena ◽

10.4028/www.scientific.net/ssp.51-52.217 ◽

1996 ◽

Vol 51-52 ◽

pp. 217-224

Author(s):

J. Rodríguez-Viejo ◽

J. Stoemenos ◽

Narcis Clavaguera ◽

Maria T. Clavaguera-Mora

Keyword(s):

Chemical Vapor Deposition ◽

Structural Characterization ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Metalorganic Chemical

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Optical and structural characterization of InGaN quantum-well heterostructures grown by metalorganic chemical vapor deposition

Compound Semiconductors 1997. Proceedings of the IEEE Twenty-Fourth International Symposium on Compound Semiconductors ◽

10.1109/iscs.1998.711624 ◽

1997 ◽

Author(s):

R.D. Dupuis ◽

P.A. Grudowski ◽

C.J. Eiting ◽

I.C. Shmagin ◽

R.M. Kolbas ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Quantum Well ◽

Structural Characterization ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Metalorganic Chemical

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Structural Characterization of High-Quality ZnS Epitaxial Layers Grown on GaAs Substrates by Low-Pressure Metalorganic Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.40.6993 ◽

2001 ◽

Vol 40 (Part 1, No. 12) ◽

pp. 6993-6997 ◽

Cited By ~ 7

Author(s):

Seiji Nakamura ◽

Shinsuke Takagimoto ◽

Tsuyoshi Ando ◽

Yoichi Yamada ◽

Tsunemasa Taguchi

Keyword(s):

Chemical Vapor Deposition ◽

Structural Characterization ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Epitaxial Layers ◽

High Quality ◽

Gaas Substrates ◽

Metalorganic Chemical

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Metalorganic chemical vapor deposition and characterization of the In‐As‐Sb‐Bi material system for infrared detection

Applied Physics Letters ◽

10.1063/1.100350 ◽

1988 ◽

Vol 53 (2) ◽

pp. 142-144 ◽

Cited By ~ 34

Author(s):

T. P. Humphreys ◽

P. K. Chiang ◽

S. M. Bedair ◽

N. R. Parikh

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Infrared Detection ◽

Material System ◽

Metalorganic Chemical

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Low-pressure Metalorganic Chemical Vapor Deposition and Characterization of YBa2Cu3O7−x Thin Films

Superconductivity and Applications ◽

10.1007/978-1-4684-7565-4_11 ◽

1990 ◽

pp. 127-138

Author(s):

P. Zawadzki ◽

G. S. Tompa ◽

P. Norris ◽

D. W. Noh ◽

B. Gallois ◽

...

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Low Pressure ◽

Metalorganic Chemical

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