Negative resistance phenomenon in dual-frequency capacitively coupled plasma-enhanced chemical vapor deposition system for photovoltaic manufacturing process

H. C. Kwon;  Aman‐ur‐Rehman; I. H. Won; W. T. Park; J. K. Lee

doi:10.1063/1.3679107

Negative resistance phenomenon in dual-frequency capacitively coupled plasma-enhanced chemical vapor deposition system for photovoltaic manufacturing process

Journal of Applied Physics ◽

10.1063/1.3679107 ◽

2012 ◽

Vol 111 (2) ◽

pp. 023305 ◽

Cited By ~ 3

Author(s):

H. C. Kwon ◽

Aman‐ur‐Rehman ◽

I. H. Won ◽

W. T. Park ◽

J. K. Lee

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Manufacturing Process ◽

Chemical Vapor ◽

Negative Resistance ◽

Dual Frequency ◽

Capacitively Coupled ◽

Capacitively Coupled Plasma

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Fabrication of vertically aligned carbon nanowalls using capacitively coupled plasma-enhanced chemical vapor deposition assisted by hydrogen radical injection

Applied Physics Letters ◽

10.1063/1.1762702 ◽

2004 ◽

Vol 84 (23) ◽

pp. 4708-4710 ◽

Cited By ~ 275

Author(s):

M. Hiramatsu ◽

K. Shiji ◽

H. Amano ◽

M. Hori

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Capacitively Coupled ◽

Vertically Aligned ◽

Carbon Nanowalls ◽

Capacitively Coupled Plasma ◽

Hydrogen Radical

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High-Performance SiOF Film Fabricated Using a Dual-Frequency-Plasma Chemical Vapor Deposition system

Japanese Journal of Applied Physics ◽

10.1143/jjap.43.5984 ◽

2004 ◽

Vol 43 (9A) ◽

pp. 5984-5989 ◽

Cited By ~ 6

Author(s):

Takashi Yoda ◽

Keiji Fujita ◽

Hideshi Miyajima ◽

Rempei Nakata ◽

Yukio Nishiyama ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

High Performance ◽

Chemical Vapor ◽

Dual Frequency ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Frequency Plasma

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Utility of dual frequency hybrid source for plasma and radical generation in plasma enhanced chemical vapor deposition process

Japanese Journal of Applied Physics ◽

10.7567/jjap.54.076201 ◽

2015 ◽

Vol 54 (7) ◽

pp. 076201 ◽

Cited By ~ 9

Author(s):

Kyung Sik Shin ◽

Bibhuti Bhusan Sahu ◽

Jeon Geon Han ◽

Masaru Hori

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Process ◽

Chemical Vapor Deposition Process ◽

Dual Frequency ◽

Radical Generation ◽

Vapor Deposition Process

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Influence of dual-frequency plasma-enhanced chemical-vapor deposition Si3N4 passivation on the electrical characteristics of AlGaN/GaN heterostructure field-effect transistors

Journal of Electronic Materials ◽

10.1007/s11664-004-0191-x ◽

2004 ◽

Vol 33 (5) ◽

pp. 400-407 ◽

Cited By ~ 22

Author(s):

W. S. Tan ◽

P. A. Houston ◽

G. Hill ◽

R. J. Airey ◽

P. J. Parbook

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Field Effect ◽

Field Effect Transistors ◽

Chemical Vapor ◽

Electrical Characteristics ◽

Dual Frequency ◽

Frequency Plasma ◽

Heterostructure Field Effect Transistors ◽

Gan Heterostructure

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Dual frequency plasma enhanced chemical vapor deposition of diamond like carbon

2009 IEEE International Conference on Plasma Science - Abstracts ◽

10.1109/plasma.2009.5227495 ◽

2009 ◽

Author(s):

S. I. Hosseini ◽

B. Shokri ◽

A. Malekfar ◽

M. Sharifian

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Diamond Like Carbon ◽

Dual Frequency ◽

Frequency Plasma

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Diamond chemical vapor deposition from a capacitively coupled radio frequency plasma

Applied Physics Letters ◽

10.1063/1.113591 ◽

1995 ◽

Vol 66 (8) ◽

pp. 1018-1020 ◽

Cited By ~ 15

Author(s):

Richard B. Jackman ◽

Judith Beckman ◽

John S. Foord

Keyword(s):

Chemical Vapor Deposition ◽

Radio Frequency ◽

Vapor Deposition ◽

Chemical Vapor ◽

Radio Frequency Plasma ◽

Capacitively Coupled ◽

Frequency Plasma ◽

Diamond Chemical Vapor Deposition

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Transparent barrier coatings on polyethylene terephthalate by single- and dual-frequency plasma-enhanced chemical vapor deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.581519 ◽

1998 ◽

Vol 16 (6) ◽

pp. 3190-3198 ◽

Cited By ~ 208

Author(s):

A. S. da Silva Sobrinho ◽

M. Latrèche ◽

G. Czeremuszkin ◽

J. E. Klemberg-Sapieha ◽

M. R. Wertheimer

Keyword(s):

Chemical Vapor Deposition ◽

Polyethylene Terephthalate ◽

Vapor Deposition ◽

Chemical Vapor ◽

Dual Frequency ◽

Barrier Coatings ◽

Transparent Barrier ◽

Frequency Plasma

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Dual-Frequency Plasma Enhanced Chemical Vapor Deposition of Diamond-Like Carbon Thin Films

Acta Physica Polonica A ◽

10.12693/aphyspola.122.230 ◽

2012 ◽

Vol 122 (1) ◽

pp. 230-235

Author(s):

R. Jamshidi ◽

S.I. Hosseini ◽

Y. Ahmadizadeh

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Diamond Like Carbon ◽

Dual Frequency ◽

Frequency Plasma ◽

Carbon Thin Films

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Study of hydrogenated silicon thin film deposited by using dual-frequency inductively-coupled plasma-enhanced chemical-vapor deposition

Journal of the Korean Physical Society ◽

10.3938/jkps.63.1140 ◽

2013 ◽

Vol 63 (6) ◽

pp. 1140-1145 ◽

Cited By ~ 3

Author(s):

Ho Beom Jeong ◽

Kyong Nam Kim ◽

Nae Eung Lee ◽

Geun Young Yeom

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Dual Frequency ◽

Silicon Thin Film ◽

Hydrogenated Silicon ◽

Inductively Coupled

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Characteristics of silicon nitride deposited by plasma‐enhanced chemical vapor deposition using a dual frequency radio‐frequency source

Journal of Applied Physics ◽

10.1063/1.351396 ◽

1992 ◽

Vol 71 (4) ◽

pp. 1838-1841 ◽

Cited By ~ 28

Author(s):

C. W. Pearce ◽

R. F. Fetcho ◽

M. D. Gross ◽

R. F. Koefer ◽

R. A. Pudliner

Keyword(s):

Chemical Vapor Deposition ◽

Silicon Nitride ◽

Radio Frequency ◽

Vapor Deposition ◽

Chemical Vapor ◽

Dual Frequency ◽

Frequency Source

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