Diamond chemical vapor deposition from a capacitively coupled radio frequency plasma

Richard B. Jackman; Judith Beckman; John S. Foord

doi:10.1063/1.113591

Diamond chemical vapor deposition from a capacitively coupled radio frequency plasma

Applied Physics Letters ◽

10.1063/1.113591 ◽

1995 ◽

Vol 66 (8) ◽

pp. 1018-1020 ◽

Cited By ~ 15

Author(s):

Richard B. Jackman ◽

Judith Beckman ◽

John S. Foord

Keyword(s):

Chemical Vapor Deposition ◽

Radio Frequency ◽

Vapor Deposition ◽

Chemical Vapor ◽

Radio Frequency Plasma ◽

Capacitively Coupled ◽

Frequency Plasma ◽

Diamond Chemical Vapor Deposition

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Synthesis of carbon nanosheets by inductively coupled radio-frequency plasma enhanced chemical vapor deposition

Carbon ◽

10.1016/j.carbon.2004.06.035 ◽

2004 ◽

Vol 42 (14) ◽

pp. 2867-2872 ◽

Cited By ~ 332

Author(s):

Jianjun Wang ◽

Mingyao Zhu ◽

Ron A. Outlaw ◽

Xin Zhao ◽

Dennis M. Manos ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Radio Frequency ◽

Vapor Deposition ◽

Chemical Vapor ◽

Radio Frequency Plasma ◽

Carbon Nanosheets ◽

Inductively Coupled ◽

Frequency Plasma

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GROWING CARBON BUCKONIONS BY RADIO FREQUENCY PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION

Acta Physica Sinica ◽

10.7498/aps.50.1264 ◽

2001 ◽

Vol 50 (7) ◽

pp. 1264

Author(s):

CHEN XIAO-HUA ◽

WU GUO-TAO ◽

DENG FU-MING ◽

WANG JIAN-XIONG ◽

YANG HANG-SHENG ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Radio Frequency ◽

Vapor Deposition ◽

Chemical Vapor ◽

Radio Frequency Plasma ◽

Frequency Plasma

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Synthesis of transparent diamond-like carbon film on the glass by radio-frequency plasma enhanced chemical vapor deposition

Journal of the Korean Crystal Growth and Crystal Technology ◽

10.6111/jkcgct.2012.22.4.190 ◽

2012 ◽

Vol 22 (4) ◽

pp. 190-193 ◽

Cited By ~ 4

Author(s):

Tae-Gyu Kim ◽

Yeong-Ho Shin ◽

Hyun Cho ◽

Jin-Kon Kim

Keyword(s):

Chemical Vapor Deposition ◽

Radio Frequency ◽

Vapor Deposition ◽

Carbon Film ◽

Chemical Vapor ◽

Diamond Like Carbon ◽

Radio Frequency Plasma ◽

Diamond Like Carbon Film ◽

Frequency Plasma

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Development ofCH4-Radio-Frequency-Plasma-Enhanced Chemical Vapor Deposition Method with a Positively Self-Biased Electrode for Diamond-Like Carbon Film

Japanese Journal of Applied Physics ◽

10.1143/jjap.36.2817 ◽

1997 ◽

Vol 36 (Part 1, No. 5A) ◽

pp. 2817-2821 ◽

Cited By ~ 6

Author(s):

Hiroshi Inaba ◽

Yuuichi Kokaku ◽

Masatomo Terakado ◽

Hiroyuki Kataoka

Keyword(s):

Chemical Vapor Deposition ◽

Radio Frequency ◽

Vapor Deposition ◽

Carbon Film ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Diamond Like Carbon ◽

Radio Frequency Plasma ◽

Deposition Method ◽

Frequency Plasma

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Synthesis of carbon nanosheets and carbon nanotubes by radio frequency plasma enhanced chemical vapor deposition

Diamond and Related Materials ◽

10.1016/j.diamond.2006.05.007 ◽

2007 ◽

Vol 16 (2) ◽

pp. 196-201 ◽

Cited By ~ 54

Author(s):

Mingyao Zhu ◽

Jianjun Wang ◽

Ronald A. Outlaw ◽

Kun Hou ◽

Dennis M. Manos ◽

...

Keyword(s):

Carbon Nanotubes ◽

Chemical Vapor Deposition ◽

Radio Frequency ◽

Vapor Deposition ◽

Chemical Vapor ◽

Radio Frequency Plasma ◽

Carbon Nanosheets ◽

Frequency Plasma

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Silicon rich silicon oxide films deposited by radio frequency plasma enhanced chemical vapor deposition method: Optical and structural properties

Applied Surface Science ◽

10.1016/j.apsusc.2011.05.112 ◽

2011 ◽

Vol 257 (23) ◽

pp. 9717-9723 ◽

Cited By ~ 24

Author(s):

Sumita Mukhopadhyay ◽

Swati Ray

Keyword(s):

Chemical Vapor Deposition ◽

Radio Frequency ◽

Structural Properties ◽

Vapor Deposition ◽

Silicon Oxide ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Radio Frequency Plasma ◽

Deposition Method ◽

Frequency Plasma

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Photovoltaic Properties of Boron-Incorporated Amorphous Carbon on n-Si Heterojunction Grown by Radio Frequency Plasma-Enhanced Chemical Vapor Deposition Using Trimethylboron

Japanese Journal of Applied Physics ◽

10.1143/jjap.42.l273 ◽

2003 ◽

Vol 42 (Part 2, No. 3B) ◽

pp. L273-L276 ◽

Cited By ~ 3

Author(s):

Yasuhiko Hayashi ◽

Tetsuo Soga ◽

Takashi Jimbo

Keyword(s):

Chemical Vapor Deposition ◽

Radio Frequency ◽

Amorphous Carbon ◽

Vapor Deposition ◽

Chemical Vapor ◽

Radio Frequency Plasma ◽

Photovoltaic Properties ◽

Frequency Plasma

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Comparative study ofa-C:H films for inertial confinement fusion prepared with various hydrocarbon precursors by radio frequency-plasma enhanced chemical vapor deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.582147 ◽

2000 ◽

Vol 18 (1) ◽

pp. 278-284 ◽

Cited By ~ 15

Author(s):

M. Theobald ◽

J. Durand ◽

P. Baclet ◽

O. Legaie

Keyword(s):

Chemical Vapor Deposition ◽

Comparative Study ◽

Radio Frequency ◽

Vapor Deposition ◽

Inertial Confinement Fusion ◽

Chemical Vapor ◽

Radio Frequency Plasma ◽

Inertial Confinement ◽

Frequency Plasma ◽

Confinement Fusion

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Radio‐frequency plasma chemical vapor deposition growth of diamond

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.575936 ◽

1989 ◽

Vol 7 (3) ◽

pp. 2325-2327 ◽

Cited By ~ 38

Author(s):

Duane E. Meyer ◽

Rodney O. Dillon ◽

John A. Woollam

Keyword(s):

Chemical Vapor Deposition ◽

Radio Frequency ◽

Vapor Deposition ◽

Chemical Vapor ◽

Radio Frequency Plasma ◽

Plasma Chemical ◽

Chemical Vapor Deposition Growth ◽

Plasma Chemical Vapor Deposition ◽

Frequency Plasma

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Structure control of carbon nanotubes using radio-frequency plasma enhanced chemical vapor deposition

Thin Solid Films ◽

10.1016/j.tsf.2003.12.002 ◽

2004 ◽

Vol 457 (1) ◽

pp. 2-6 ◽

Cited By ~ 29

Author(s):

T. Kato ◽

G.-H. Jeong ◽

T. Hirata ◽

R. Hatakeyama

Keyword(s):

Carbon Nanotubes ◽

Chemical Vapor Deposition ◽

Radio Frequency ◽

Vapor Deposition ◽

Chemical Vapor ◽

Radio Frequency Plasma ◽

Structure Control ◽

Frequency Plasma

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