Microwave-induced low-temperature crystallization of amorphous silicon thin films

1997 ◽  
Vol 82 (6) ◽  
pp. 2918-2921 ◽  
Author(s):  
Jeong No Lee ◽  
Yong Woo Choi ◽  
Bum Joo Lee ◽  
Byung Tae Ahn
Keyword(s):  
Thin Films ◽  
Low Temperature ◽  
Amorphous Silicon ◽  
Silicon Thin Films ◽  
Low Temperature Crystallization ◽  
Temperature Crystallization

Laser stimulated low-temperature crystallization of amorphous silicon

2006 ◽  
Vol 32 (3) ◽  
pp. 259-261 ◽  
Author(s):  
S. A. Avsarkisov ◽  
Z. V. Jibuti ◽  
N. D. Dolidze ◽  
B. E. Tsekvava
Keyword(s):  
Low Temperature ◽  
Amorphous Silicon ◽  
Low Temperature Crystallization ◽  
Temperature Crystallization

Low-temperature crystallization and paraelectric–ferroelectric phase transformation in nanoscale ZrO2 thin films induced by atomic layer plasma treatment

2020 ◽  
Vol 8 (11) ◽  
pp. 3669-3677
Author(s):  
Sheng-Han Yi ◽  
Kuei-Wen Huang ◽  
Hsin-Chih Lin ◽  
Miin-Jang Chen
Keyword(s):  
Thin Films ◽  
Phase Transformation ◽  
Low Temperature ◽  
Plasma Treatment ◽  
Ferroelectric Phase ◽  
Atomic Layer ◽  
Treatment Technique ◽  
Low Temperature Crystallization ◽  
Temperature Crystallization

Crystallization and ferroelectricity with high endurance are achieved in ZrO2 thin films at low temperature using an atomic layer plasma treatment technique.

Lattice Guiding for Low Temperature Crystallization of Rhombohedral Perovskite-Structured Oxide Thin Films

2010 ◽  
Vol 10 (2) ◽  
pp. 761-764 ◽  
Author(s):  
Sharath Sriram ◽  
Madhu Bhaskaran ◽  
David R. G. Mitchell ◽  
Arnan Mitchell
Keyword(s):  
Thin Films ◽  
Low Temperature ◽  
Oxide Thin Films ◽  
Low Temperature Crystallization ◽  
Temperature Crystallization
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