scholarly journals Hydrogen in amorphous and microcrystalline silicon films prepared by hydrogen dilution

1996 ◽  
Vol 80 (9) ◽  
pp. 4971-4975 ◽  
Author(s):  
U. Kroll ◽  
J. Meier ◽  
A. Shah ◽  
S. Mikhailov ◽  
J. Weber
Keyword(s):  
Silicon Films ◽  
Microcrystalline Silicon ◽  
Hydrogen Dilution

Room Temperature Fabrication of Micro-Crystalline Silicon Films for Tft's By Ecr Pecvd

1993 ◽  
Vol 334 ◽  
Author(s):  
Yoo-Chan Jeon ◽  
Seok-Woon Lee ◽  
Seung-Ki Joo
Keyword(s):  
Silicon Nitride ◽  
Crystalline Phase ◽  
Etch Rate ◽  
Room Temperature ◽  
Crystalline Silicon ◽  
Silicon Films ◽  
Microcrystalline Silicon ◽  
Hydrogen Dilution ◽  
Crystalline Films ◽  
Etched Silicon

AbstractMicrocrystalline silicon films were formed at room temperature without hydrogen dilution by ECR PECVD. Microwave power more than 400 W was necessary to get crystalline films and the crystallinity increased with the power thereafter. Addition of hydrogen and argon enhanced the crystalline phase formation and the deposition rate, the reason of which was found that hydrogen etched silicon films and argon addition drastically increased the etch rate. Annealing of the films showed that microcrystalline silicon films formed by ECR PECVD have a small fraction of amorphous phase. TFT's using silicon nitride and doped/undoped microcrystalline silicon films were fabricatedd with whole processes at room temperature.

Improved transport properties of microcrystalline silicon films grown by HWCVD with a variable hydrogen dilution process

2008 ◽  
Vol 516 (5) ◽  
pp. 568-571 ◽  
Author(s):  
Chisato Niikura ◽  
Romain Brenot ◽  
Joelle Guillet ◽  
Jean-Eric Bourée
Keyword(s):  
Transport Properties ◽  
Silicon Films ◽  
Microcrystalline Silicon ◽  
Hydrogen Dilution

Microcrystalline Silicon Films Deposited by Cathode‐Type RF Glow Discharge Technique

1995 ◽  
Vol 142 (5) ◽  
pp. 1663-1666 ◽  
Author(s):  
Ahalapitiya Hewage Jayatissa ◽  
Yoichiro Nakanishi ◽  
Yosinori Hatanaka
Keyword(s):  
Glow Discharge ◽  
Silicon Films ◽  
Microcrystalline Silicon ◽  
Rf Glow Discharge

Preparation and properties of microcrystalline silicon films using photochemical vapor deposition

1983 ◽  
Vol 59-60 ◽  
pp. 715-718 ◽  
Author(s):  
Tadashi Saitoh ◽  
Toshikazu Shimada ◽  
Masataka Migitaka ◽  
Yasuo Tarui
Keyword(s):  
Vapor Deposition ◽  
Silicon Films ◽  
Microcrystalline Silicon ◽  
Photochemical Vapor Deposition

STM on doped and undoped hydrogenated amorphous and microcrystalline silicon films

1992 ◽  
Vol 42-44 ◽  
pp. 1398-1402 ◽  
Author(s):  
W. Zimmermann-Edling ◽  
R. Wiesendanger ◽  
F. Finger ◽  
K. Prasad ◽  
A. Shah
Keyword(s):  
Silicon Films ◽  
Microcrystalline Silicon ◽  
Hydrogenated Amorphous
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