The oxide nitride oxide film deposition on the tunnel‐structured polycrystalline silicon (polysilicon) electrodes for high‐density dRAMs

1991 ◽  
Vol 70 (9) ◽  
pp. 5085-5089 ◽  
Author(s):  
Naoto Matsuo ◽  
Yoshirou Nakata ◽  
Shouzou Okada
Keyword(s):  
Oxide Film ◽  
Polycrystalline Silicon ◽  
Film Deposition ◽  
High Density ◽  
Nitride Oxide

Oxide film deposition by Gas-Cluster ion assisted deposition

1999 ◽  
Author(s):  
K. Murai ◽  
S. Tamura ◽  
M. Kiuchi ◽  
N. Umesaki ◽  
E. Minami ◽  
...  
Keyword(s):  
Oxide Film ◽  
Film Deposition ◽  
Cluster Ion

Carbon-nanotube-based nonvolatile memory with oxide–nitride–oxide film and nanoscale channel

2003 ◽  
Vol 82 (2) ◽  
pp. 275-277 ◽  
Author(s):  
Won Bong Choi ◽  
Soodoo Chae ◽  
Eunju Bae ◽  
Jo-Won Lee ◽  
Byoung-Ho Cheong ◽  
...  
Keyword(s):  
Carbon Nanotube ◽  
Oxide Film ◽  
Nonvolatile Memory ◽  
Nitride Oxide

scholarly journals The Role Played in the Improvement of the SiO2/SiC Interface by a Thin SiO2 Film Thermally Grown Prior to Oxide Film Deposition

2012 ◽  
Vol 2 (1) ◽  
pp. P8-P10 ◽  
Author(s):  
E. Pitthan ◽  
R. Palmieri ◽  
S. A. Correa ◽  
G. V. Soares ◽  
H. I. Boudinov ◽  
...  
Keyword(s):  
Oxide Film ◽  
Sio2 Film ◽  
Film Deposition ◽  
Thermally Grown
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