scholarly journals Potential of High-density Convergent Plasma Sputtering Device for Magnetic Film Deposition

2019 ◽  
Vol 17 (0) ◽  
pp. 27-31
Author(s):  
Taisei Motomura ◽  
Tatsuo Tabaru
Keyword(s):  
Magnetic Film ◽  
Film Deposition ◽  
High Density ◽  
Plasma Sputtering

Characterization of Sputtered Films using the Scanning Electron Microscope

1973 ◽  
Vol 31 ◽  
pp. 44-45
Author(s):  
R. F. Schneidmiller ◽  
W. F. Thrower ◽  
C. Ang
Keyword(s):  
Electron Microscope ◽  
Scanning Electron Microscope ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Sputtered Films ◽  
Plasma Sputtering ◽  
Microelectronic Devices ◽  
Control Film ◽  
Scanning Electron

Solid state materials in the form of thin films have found increasing structural and electronic applications. Among the multitude of thin film deposition techniques, the radio frequency induced plasma sputtering has gained considerable utilization in recent years through advances in equipment design and process improvement, as well as the discovery of the versatility of the process to control film properties. In our laboratory we have used the scanning electron microscope extensively in the direct and indirect characterization of sputtered films for correlation with their physical and electrical properties.Scanning electron microscopy is a powerful tool for the examination of surfaces of solids and for the failure analysis of structural components and microelectronic devices.

High-density dispersion of single platinum atoms on graphene by plasma sputtering in N2 atmosphere

2018 ◽  
Vol 11 (9) ◽  
pp. 095101 ◽  
Author(s):  
Kenji Yamazaki ◽  
Yosuke Maehara ◽  
Ryo Kitajima ◽  
Yuta Fukami ◽  
Kazutoshi Gohara
Keyword(s):  
High Density ◽  
Plasma Sputtering ◽  
N2 Atmosphere

High-density remote plasma sputtering of high-dielectric-constant amorphous hafnium oxide films

2013 ◽  
Vol 250 (5) ◽  
pp. 957-967 ◽  
Author(s):  
Flora M. Li ◽  
Bernhard C. Bayer ◽  
Stephan Hofmann ◽  
Stuart P. Speakman ◽  
Caterina Ducati ◽  
...  
Keyword(s):  
Dielectric Constant ◽  
Hafnium Oxide ◽  
High Dielectric Constant ◽  
Oxide Films ◽  
High Density ◽  
Remote Plasma ◽  
Plasma Sputtering ◽  
High Dielectric

High-density very efficient magnetic film memory arrays

1969 ◽  
Vol 5 (3) ◽  
pp. 408-412 ◽  
Author(s):  
A. Pohm ◽  
Jish-Min Wang ◽  
F. Lee ◽  
W. Schnasse ◽  
T. Smay
Keyword(s):  
Magnetic Film ◽  
High Density ◽  
Memory Arrays

Ultrafast Deposition of Crystalline Si Films Using a High Density Microwave Plasma

2010 ◽  
Vol 1245 ◽  
Author(s):  
Haijun Jia ◽  
Michio Kondo
Keyword(s):  
Film Growth ◽  
Microwave Plasma ◽  
Crystalline Silicon ◽  
Plasma Source ◽  
Ambient Air ◽  
Film Deposition ◽  
High Density ◽  
Silicon Films ◽  
Reduced Pressure ◽  
Si Films

AbstractA multi-pressure microwave plasma source is developed and is applied for the fast deposition of crystalline silicon films. In this paper, the plasma source is diagnosed firstly. Electron density, electron temperature and discharge gas temperature of the plasmas generated in ambient air are studied using optical emission spectroscopy (OES) method. By using the high density microwave plasma source, depositions of crystalline silicon films from SiH4+He mixture at reduced pressure conditions are investigated systematically. After optimizing the film deposition conditions, highly crystallized Si films are deposited at a rate higher than 700 nm/s. We also find that the deposited films are fully crystallized and crystalline structure of the deposited film evolves along the film growth direction, i.e. large grains in surface region while small grains in the bottom region of the film. Based on the observed results, a possible mechanism, the annealing-assisted plasma-enhanced chemical vapor deposition, is proposed to describe the film growth process.

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