Annealing behavior of deep‐level defects in semi‐insulating gallium arsenide studied by photoluminescence, infrared absorption, and resistivity mapping

1991 ◽  
Vol 69 (8) ◽  
pp. 4310-4317 ◽  
Author(s):  
M. Müllenborn ◽  
H. Ch. Alt ◽  
A. Heberle
Author(s):  
Nataliya Mitina ◽  
Vladimir Krylov

The results of an experiment to determine the activation energy of a deep level in a gallium arsenide mesastructure, obtained by the method of capacitive deep levels transient spectroscopy with data processing according to the Oreshkin model and Lang model, are considered.


Author(s):  
Aleksey Bogachev ◽  
Vladimir Krylov

The results of an experiment to determine the activation energy of a deep level in a gallium arsenide mesastructure by capacitive relaxation spectroscopy of deep levels at various values of the blocking voltage are considered.


1961 ◽  
Vol 1 (2) ◽  
pp. 111-115 ◽  
Author(s):  
T.S. Moss ◽  
T.D.F. Hawkins

1974 ◽  
Vol 45 (3) ◽  
pp. 1009-1012 ◽  
Author(s):  
P. C. Leung ◽  
J. Fredrickson ◽  
W. G. Spitzer ◽  
A. Kahan ◽  
L. Bouthillette

1993 ◽  
Vol 46 (3) ◽  
pp. 435
Author(s):  
C Jagadish ◽  
A Clark ◽  
G Li ◽  
CA Larson ◽  
N Hauser ◽  
...  

Undoped and doped layers of gallium arsenide and aluminium gallium arsenide have been grown on gallium arsenide by low-pressure metal organic vapour-phase epitaxy (MOVPE). Delta doping and growth on silicon substrates have also been attempted. Of particular interest in the present study has been the influence of growth parameters, such as growth temperature, group III mole fraction and dopant flow, on the electrical and physical properties of gallium arsenide layers. An increase in growth temperature leads to increased doping efficiency in the case of silicon, whereas the opposite is true in the case of zinc. Deep level transient spectroscopy (DTLS) studies on undoped GaAs layers showed two levels, the expected EL2 level and a carbon-related level. The determination of optimum growth conditions has allowed good quality GaAs and AlGaAs epitaxial layers to be produced for a range of applications.`


1987 ◽  
Vol 62 (7) ◽  
pp. 2946-2949 ◽  
Author(s):  
N. M. Haegel ◽  
A. Winnacker ◽  
K. Leo ◽  
W. W. Rühle ◽  
S. Gisdakis
Keyword(s):  

1994 ◽  
Vol 373 ◽  
Author(s):  
R. Mih ◽  
R. Gronsky

AbstractPositron annihilation lifetime spectroscopy (PALS) is a unique technique for detection of vacancy related defects in both as-grown and irradiated materials. We present a systematic study of vacancy defects in stoichiometrically controlled p-type Gallium Arsenide grown by the Hot- Wall Czochralski method. Microstructural information based on PALS, was correlated to crystallographic data and electrical measurements. Vacancies were detected and compared to electrical levels detected by deep level transient spectroscopy and stoichiometry based on crystallographic data.


Sign in / Sign up

Export Citation Format

Share Document