Preparation of hydrogenated amorphous silicon with tunable gap by homogeneous chemical vapor deposition

Z. M. Qian; A. Van Ammel; H. Michiel; J. Nijs; R. Mertens

doi:10.1063/1.347106

Preparation of hydrogenated amorphous silicon with tunable gap by homogeneous chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.347106 ◽

1990 ◽

Vol 68 (1) ◽

pp. 143-155 ◽

Cited By ~ 7

Author(s):

Z. M. Qian ◽

A. Van Ammel ◽

H. Michiel ◽

J. Nijs ◽

R. Mertens

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

Homogeneous Chemical ◽

Hydrogenated Amorphous

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The preparation ofinsitudoped hydrogenated amorphous silicon by homogeneous chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.332172 ◽

1983 ◽

Vol 54 (3) ◽

pp. 1461-1465 ◽

Cited By ~ 23

Author(s):

B. S. Meyerson ◽

B. A. Scott ◽

D. J. Wolford

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

Homogeneous Chemical ◽

Hydrogenated Amorphous

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Influences of trace metal impurities on the thermal quenching of photoluminescence in hydrogenated amorphous silicon by homogeneous chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.103137 ◽

1990 ◽

Vol 56 (16) ◽

pp. 1591-1593 ◽

Cited By ~ 2

Author(s):

Z. M. Qian ◽

J. Nijs ◽

H. Michiel ◽

J. Leclair ◽

W. Vandervorst ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Trace Metal ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Hydrogenated Amorphous Silicon ◽

Thermal Quenching ◽

Chemical Vapor ◽

Metal Impurities ◽

Homogeneous Chemical ◽

Hydrogenated Amorphous

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In situ optical diagnosis on hydrogenated amorphous silicon grown by vibration superimposed plasma chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.114284 ◽

1995 ◽

Vol 66 (9) ◽

pp. 1071-1073 ◽

Cited By ~ 5

Author(s):

Nobuo Naito ◽

Akihiro Takano ◽

Masatomo Sumiya ◽

Masashi Kawasaki ◽

Hideomi Koinuma

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

Optical Diagnosis ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Hydrogenated Amorphous

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X‐ray photoelectron spectroscopy analysis of photostimulated chemical vapor deposition hydrogenated amorphous silicon/amorphous aluminum oxide

Applied Physics Letters ◽

10.1063/1.107407 ◽

1992 ◽

Vol 60 (10) ◽

pp. 1208-1210 ◽

Cited By ~ 1

Author(s):

K. Uwasawa ◽

F. Ishihara ◽

S. Matsumoto

Keyword(s):

Chemical Vapor Deposition ◽

Aluminum Oxide ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Photoelectron Spectroscopy ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

Spectroscopy Analysis ◽

X Ray ◽

Hydrogenated Amorphous

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Effects of silicon–hydrogen bond characteristics on the crystallization of hydrogenated amorphous silicon films prepared by plasma enhanced chemical vapor deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.582049 ◽

1999 ◽

Vol 17 (6) ◽

pp. 3240-3245 ◽

Cited By ~ 21

Author(s):

Hae-Yeol Kim ◽

Jae-Beom Choi ◽

Jai-Young Lee

Keyword(s):

Hydrogen Bond ◽

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

Silicon Films ◽

Hydrogenated Amorphous ◽

Bond Characteristics

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Influence of RF Bias on Hydrogenated Amorphous Silicon by High-Density Plasma Chemical Vapor Deposition

Journal of The Electrochemical Society ◽

10.1149/1.2713723 ◽

2007 ◽

Vol 154 (5) ◽

pp. G122 ◽

Cited By ~ 9

Author(s):

Wen-Chu Hsiao ◽

Chuan-Pu Liu ◽

Ying-Lang Wang

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

High Density ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Hydrogenated Amorphous ◽

Density Plasma

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Thermal properties of hydrogenated amorphous silicon prepared by high-density plasma chemical vapor deposition

Journal of Physics and Chemistry of Solids ◽

10.1016/j.jpcs.2007.07.095 ◽

2008 ◽

Vol 69 (2-3) ◽

pp. 648-652 ◽

Cited By ~ 4

Author(s):

Wen-Chu Hsiao ◽

Chuan-Pu Liu ◽

Ying-Lang Wang

Keyword(s):

Thermal Properties ◽

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Hydrogenated Amorphous ◽

Density Plasma

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Hydrogenated amorphous silicon carbide deposition using electron cyclotron resonance chemical vapor deposition under high microwave power and strong hydrogen dilution

Journal of Applied Physics ◽

10.1063/1.1500418 ◽

2002 ◽

Vol 92 (5) ◽

pp. 2937-2941 ◽

Cited By ~ 41

Author(s):

K. Chew ◽

Rusli ◽

S. F. Yoon ◽

J. Ahn ◽

V. Ligatchev ◽

...

Keyword(s):

Silicon Carbide ◽

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

Hydrogen Dilution ◽

Hydrogenated Amorphous

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Effective Passivation of Black Silicon Surfaces via Plasma‐Enhanced Chemical Vapor Deposition Grown Conformal Hydrogenated Amorphous Silicon Layer

physica status solidi (RRL) - Rapid Research Letters ◽

10.1002/pssr.201900087 ◽

2019 ◽

Vol 14 (1) ◽

pp. 1900087 ◽

Cited By ~ 4

Author(s):

Engin Özkol ◽

Paul Procel ◽

Yifeng Zhao ◽

Luana Mazzarella ◽

Rostislav Medlin ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Hydrogenated Amorphous Silicon ◽

Silicon Layer ◽

Chemical Vapor ◽

Silicon Surfaces ◽

Black Silicon ◽

Hydrogenated Amorphous

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Production of disilane and silyl sticking coefficients during plasma‐enhanced chemical vapor deposition of hydrogenated amorphous silicon

Applied Physics Letters ◽

10.1063/1.101375 ◽

1989 ◽

Vol 54 (17) ◽

pp. 1642-1644 ◽

Cited By ~ 12

Author(s):

Michael J. McCaughey ◽

Mark J. Kushner

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

Hydrogenated Amorphous ◽

Sticking Coefficients

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