Elimination of slips on silicon wafer edge in rapid thermal process by using a ring oxide

1990 ◽  
Vol 67 (12) ◽  
pp. 7583-7586 ◽  
Author(s):  
Byung‐Jin Cho ◽  
Choong‐Ki Kim
Keyword(s):  
Silicon Wafer ◽  
Thermal Process ◽  
Rapid Thermal Process ◽  
Wafer Edge

Effect of nitrogen doping on denuded zone formed by rapid thermal process in Czochralski silicon wafer

2006 ◽  
Vol 376-377 ◽  
pp. 216-219 ◽  
Author(s):  
Can Cui ◽  
Deren Yang ◽  
Xiangyang Ma ◽  
Ruixin Fan ◽  
Liben Li ◽  
...  
Keyword(s):  
Silicon Wafer ◽  
Thermal Process ◽  
Nitrogen Doping ◽  
Rapid Thermal Process ◽  
Czochralski Silicon

Oxide precipitation behavior in heavily doped silicon wafer after rapid thermal process

2006 ◽  
Vol 9 (1-3) ◽  
pp. 78-81 ◽  
Author(s):  
Shilong Sun ◽  
Weizhong Sun ◽  
Qiuyan Hao ◽  
Lijian Wang ◽  
Xiaoyun Teng ◽  
...  
Keyword(s):  
Silicon Wafer ◽  
Thermal Process ◽  
Precipitation Behavior ◽  
Rapid Thermal Process ◽  
Doped Silicon ◽  
Heavily Doped

scholarly journals Improvement of temperature homogeneity of a silicon wafer heated in a rapid thermal system (RTP: Rapid Thermal Process) by a filtering window

2015 ◽  
Vol 77 ◽  
pp. 76-89 ◽  
Author(s):  
Pierre-Olivier Logerais ◽  
Olivier Riou ◽  
Fabien Delaleux ◽  
Jean-Félix Durastanti ◽  
Anne Bouteville
Keyword(s):  
Silicon Wafer ◽  
Thermal Process ◽  
Thermal System ◽  
Rapid Thermal Process ◽  
Temperature Homogeneity

Effect of Rapid Thermal Process on Oxygen Precipitation in Heavily Boron-Doped Czochralski Silicon Wafer

2003 ◽  
Vol 42 (Part 1, No. 12) ◽  
pp. 7290-7291 ◽  
Author(s):  
Chunlong Li ◽  
Xiangyang Ma ◽  
Jin Xu ◽  
Xuegong Yu ◽  
Deren Yang ◽  
...  
Keyword(s):  
Silicon Wafer ◽  
Thermal Process ◽  
Rapid Thermal Process ◽  
Czochralski Silicon ◽  
Oxygen Precipitation ◽  
Boron Doped

Nitrogen-doped Czochralski silicon treated in rapid thermal process

2006 ◽  
Vol 134 (2-3) ◽  
pp. 193-201 ◽  
Author(s):  
Deren Yang ◽  
Ming Li ◽  
Can Cui ◽  
Xiangyang Ma ◽  
Duanlin Que
Keyword(s):  
Thermal Process ◽  
Rapid Thermal Process ◽  
Nitrogen Doped ◽  
Czochralski Silicon

Non-Prefabricated Nanocrystal Mesoporous TiO2-Based Photoanodes Tuned by A Layer-by-Layer and Rapid Thermal Process

2009 ◽  
Vol 2 (1) ◽  
pp. 265-269 ◽  
Author(s):  
Junchao Tao ◽  
Yan Sun ◽  
Meiying Ge ◽  
Xin Chen ◽  
Ning Dai
Keyword(s):  
Thermal Process ◽  
Mesoporous Tio2 ◽  
Layer By Layer ◽  
Rapid Thermal Process

Intermediate band materials obtained by rapid thermal process of Co-implanted silicon

2017 ◽  
Vol 209 ◽  
pp. 522-524 ◽  
Author(s):  
Jiren Yuan ◽  
Haibin Huang ◽  
Xinhua Deng ◽  
Mingang Gong ◽  
Cuicui Liu ◽  
...  
Keyword(s):  
Thermal Process ◽  
Rapid Thermal Process ◽  
Intermediate Band

Induced changes on visible emission and conductive type in N-doped ZnO films by rapid thermal process

2010 ◽  
Vol 28 (5) ◽  
pp. 1115-1121 ◽  
Author(s):  
Z. P. Shan ◽  
S. L. Gu ◽  
K. P. Wu ◽  
S. M. Zhu ◽  
K. Tang ◽  
...  
Keyword(s):  
Thermal Process ◽  
Visible Emission ◽  
Zno Films ◽  
Rapid Thermal Process ◽  
Doped Zno ◽  
Induced Changes
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