The effects of dopants on surface‐energy‐driven secondary grain growth in silicon films

1990 ◽  
Vol 67 (2) ◽  
pp. 757-767 ◽  
Author(s):  
H.‐J. Kim ◽  
C. V. Thompson
1987 ◽  
Vol 61 (4) ◽  
pp. 1652-1655 ◽  
Author(s):  
S. M. Garrison ◽  
R. C. Cammarata ◽  
C. V. Thompson ◽  
Henry I. Smith

1990 ◽  
Vol 202 ◽  
Author(s):  
L. H. Chou ◽  
M. C. Kuo

ABSTRACTThin Sb films have been prepared on glass substrates by rapid thermal evaporation. Films with thicknesses varied from 260 Å to 1300Å were used for the study. X-ray diffraction data showed that for films deposited at room substrate temperature, an almost random grain orientation was observed for films of 1300 Å thick and a tendency for preferred grain orientation was observed as films got thinner. For films of 260 Å thick, only two x-ray diffraction peaks--(003) and (006) were observed. After thermal annealing, secondary grains grew to show preferred orientation in all the films. This phenomenon was explained by surface-energy-driven secondary grain growth. This paper reports the effects of annealing time and film thickness on the secondary grain growth and the evolution of thin Sb film microstmctures. Transmission electron microscopy (TEM) and x-ray diffraction were used to characterize the films.


2016 ◽  
Vol 37 (3) ◽  
pp. 291-294 ◽  
Author(s):  
Seonghyun Jin ◽  
Younwoo Choe ◽  
Suhui Lee ◽  
Tae-Woong Kim ◽  
Mallory Mativenga ◽  
...  

1986 ◽  
Vol 48 (5) ◽  
pp. 335-337 ◽  
Author(s):  
Chee C. Wong ◽  
Henry I. Smith ◽  
C. V. Thompson
Keyword(s):  

1984 ◽  
Vol 45 (6) ◽  
pp. 631-633 ◽  
Author(s):  
T. Yonehara ◽  
Henry I. Smith ◽  
C. V. Thompson ◽  
J. E. Palmer

1984 ◽  
Vol 35 ◽  
Author(s):  
S.J. Krause ◽  
S.R. Wilson ◽  
W.M. Paulson ◽  
R.B. Gregory

ABSTRACTPolycrystalline silicon films of 300 nm thickness were deposited on oxidized wafer surfaces, implanted with As, and annealed on a Varian IA 200 rapid thermal annealer. Transmission electron microscopy was used to study through-thickness and cross sectional views of grain size and morphology of as-deposited and of transient annealed films. A bimoda] distribution of grain sizes was present in as-deposited polycrystalline silicon films. The first population was due to columnar growth of some grains to a final average diameter of 20 rm. The second population of small equiaxed grains of 5 nm average diameter were formed early in the deposition process. During transient annealing grains in the first population grew rapidly up to 280-nm equiaxed grains. After this the growth rate decreased due to the grain size reaching the thickness of the film. Grains in the second population grew rapidly up to a size of 150 nm, after which the growth rate was lowered due to grains impinging upon one another. The grain growth processes for both populations have been described with a modified model for interfacially driven grain growth. This model accounts for diffusion and grain growth which occur with rapidly rising and falling temperatures during short annealing times characteristic of transient annealing processes.


Author(s):  
Suok-Min Na ◽  
Alison B. Flatau

The surface-energy-induced selective grain growth with a specific plane can be governed in polycrystalline Fe-Ga-B alloys doped with sulfur. The segregated sulfur during texture annealing played an important role in controlling the surface energy to induce the selective growth of {100} or {110} grains, corresponding to maximum magnetostrictive performance, along <001> orientation with respect to rolling direction. The results show that sulfur diffuses (adsorbs) from bulk interior (sulfur atmosphere) then segregates on the surface. The amount of segregated sulfur increases with an increase of annealing time at the temperature of 1200°C. Auger electron spectroscopy (AES) and X-ray photoelectron spectroscopy (XPS) data on the surface as well as selective development of {100}<001> and {110}<001> preferred textures are presented in this work. The XPS fitted peaks of S 2p3/2 at binding energy of 161.2 and 163.2 eV for annealed Fe-Ga-B doped with sulfur represent the presence of stoichiometric FeS and FeSn (polysulfide), respectively. For all of the sulfur-free Fe-Ga-B sheets annealed in the ampoule with sulfur element, XPS indicated contributions centered at approximately 161.7 (S 2p) that has been assigned to iron sulfide as well. The presence of FeS was clearly confirmed by XRD patterns and XPS fitted peak positions at 161.5 eV (S 2p3/2) and 710.2 eV (Fe 2p3/2). The segregation of sulfur and boron during annealing were also confirmed by AES depth profile results, which exhibited peak concentrations of 10 at.%S and 20 at.%B at the surface, respectively. The peak magnetostriction of 201 ppm was obtained at annealed (Fe81.3Ga18.7)99B1 alloy with near {100}<001> orientation under sulfur atmosphere containing the amounts of 6.4 mg S. On the other hand, the texture of sulfur-free Fe-Ga-B alloy was close to {110}<001> after annealing at 1200°C for 6h under flowing argon, corresponding to the magnetostriction of 160 ppm.


2017 ◽  
Vol 7 (1) ◽  
Author(s):  
Yonghui Zheng ◽  
Yan Cheng ◽  
Rong Huang ◽  
Ruijuan Qi ◽  
Feng Rao ◽  
...  

Sign in / Sign up

Export Citation Format

Share Document