Critical tensile strain and water vapor transmission rate for nanolaminate films grown using Al2O3 atomic layer deposition and alucone molecular layer deposition

2012 ◽  
Vol 101 (23) ◽  
pp. 234103 ◽  
Author(s):  
Shih-Hui Jen ◽  
Byoung H. Lee ◽  
Steven M. George ◽  
Robert S. McLean ◽  
Peter F. Carcia
Keyword(s):  
Water Vapor ◽  
Atomic Layer Deposition ◽  
Tensile Strain ◽  
Transmission Rate ◽  
Molecular Layer ◽  
Atomic Layer ◽  
Water Vapor Transmission Rate ◽  
Molecular Layer Deposition ◽  
Layer Deposition ◽  
Water Vapor Transmission

scholarly journals Characterization of oxide barrier layers prepared by atomic layer deposition

2017 ◽  
Vol 9 (7) ◽  
pp. 168781401771180 ◽  
Author(s):  
Fa-Ta Tsai ◽  
Ching-Kong Chao ◽  
Kai-Jyun Jhong ◽  
Rwei-Ching Chang
Keyword(s):  
Water Vapor ◽  
Atomic Layer Deposition ◽  
Layer Structure ◽  
Transmission Rate ◽  
Single Layer ◽  
Atomic Layer ◽  
Optical Transmittance ◽  
Double Layer Structure ◽  
Layer Deposition ◽  
Water Vapor Transmission

Atomic layer deposition has become an important thin-film growth technique for producing gas diffusion barriers because of its low process temperature and its ability to produce uniform films. In this work, atomic layer deposition was used to deposit various Al2O3 and ZnO thin films on polyethylene terephthalate substrates; subsequently, the physical properties and water vapor transmission rates of the films were characterized. Single and hybrid films (Al2O3, ZnO, Al2O3/ZnO, and ZnO/Al2O3) with thicknesses of 25, 50, and 100 nm at a deposition temperature of 60°C were investigated. The deposited films were characterized for surface roughness, optical transmittance, adhesion, water vapor transmission rate, and contact angle. The results showed that the double-layer structure provided a higher water vapor transmission rate and higher adhesion strength than those of the single-layer structure although both the surface roughness and optical transmittance of the single-layer structure were slightly better than those of the double-layer structure. The results revealed that the atomic layer deposition-grown hybrids could act as water vapor barriers.

scholarly journals Low-temperature atomic layer deposition of Al2O3/alucone nanolaminates for OLED encapsulation

RSC Advances ◽  
2019 ◽  
Vol 9 (36) ◽  
pp. 20884-20891 ◽  
Author(s):  
Guixiong Chen ◽  
Yalian Weng ◽  
Fan Sun ◽  
Xiongtu Zhou ◽  
Chaoxing Wu ◽  
...  
Keyword(s):  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Molecular Layer ◽  
Atomic Layer ◽  
Barrier Properties ◽  
Organic Light Emitting Diodes ◽  
Molecular Layer Deposition ◽  
Light Emitting ◽  
Organic Light ◽  
Layer Deposition

Al2O3/alucone laminates were fabricated by atomic layer deposition (ALD) and molecular layer deposition (MLD), showing good barrier properties. These laminates were found to prolong the lifetime of organic light-emitting diodes (OLEDs) evidently.

Novel materials by atomic layer deposition and molecular layer deposition

MRS Bulletin ◽  
2011 ◽  
Vol 36 (11) ◽  
pp. 877-884 ◽  
Author(s):  
Markku Leskelä ◽  
Mikko Ritala ◽  
Ola Nilsen
Keyword(s):  
Atomic Layer Deposition ◽  
Molecular Layer ◽  
Atomic Layer ◽  
Molecular Layer Deposition ◽  
Novel Materials ◽  
Layer Deposition ◽  
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