Electron and chemical kinetics in methane rf glow‐discharge deposition plasmas

1989 ◽  
Vol 65 (1) ◽  
pp. 70-78 ◽  
Author(s):  
Laurence E. Kline ◽  
William D. Partlow ◽  
William E. Bies
Keyword(s):  
Glow Discharge ◽  
Chemical Kinetics ◽  
Rf Glow Discharge ◽  
Glow Discharge Deposition

Saddle-Field Glow-Discharge Deposition of Amorphous Semiconductors

1996 ◽  
Vol 420 ◽  
Author(s):  
F. Gaspari ◽  
L. S. Sidhu ◽  
S. K. O'leary ◽  
S. Zukotynski
Keyword(s):  
Growth Rate ◽  
Glow Discharge ◽  
Significant Role ◽  
Mass Spectra ◽  
Film Surface ◽  
Amorphous Semiconductors ◽  
Glow Discharges ◽  
Rf Glow Discharge ◽  
Dc Saddle Field ◽  
Glow Discharge Deposition

AbstractWe present a dc saddle-field glow-discharge deposition procedure which combines the positive attributes of the conventional dc and rf glow-discharge techniques. Preliminary mass spectra analyses of both silane and methane glow-discharges demonstrates that ions constitute a significant fraction of the species reaching the film surface. Growth rate analyses suggest that ions play a significant role in the saddle-field glow-discharge deposition of amorphous semiconducting films.

Current-voltage characteristics of aluminium nitride films formed by RF glow discharge

1980 ◽  
Vol 13 (6) ◽  
pp. L101-L105 ◽  
Author(s):  
D Mangalaraj ◽  
M Radhakrishnan ◽  
C Balasubramanian ◽  
A R Kasilingam
Keyword(s):  
Glow Discharge ◽  
Aluminium Nitride ◽  
Current Voltage ◽  
Rf Glow Discharge ◽  
Current Voltage Characteristics

Microcrystalline Silicon Films Deposited by Cathode‐Type RF Glow Discharge Technique

1995 ◽  
Vol 142 (5) ◽  
pp. 1663-1666 ◽  
Author(s):  
Ahalapitiya Hewage Jayatissa ◽  
Yoichiro Nakanishi ◽  
Yosinori Hatanaka
Keyword(s):  
Glow Discharge ◽  
Silicon Films ◽  
Microcrystalline Silicon ◽  
Rf Glow Discharge

Quantitative Studies of Glow-Discharge Deposition Using Optical Emission Spectroscopy

1984 ◽  
Vol 38 ◽  
Author(s):  
F. J. Kampas
Keyword(s):  
Electrical Properties ◽  
Glow Discharge ◽  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Optical Emission ◽  
Secondary Electrons ◽  
Rf Discharges ◽  
Quantitative Studies ◽  
Glow Discharge Deposition

AbstractIntensities of CH optical emission and electrical properties of methane rf discharges as a function of pressure are presented and discussed. The results are consistent with a model in which the properties of the discharge are dominated by secondary electrons traversing the gap between the electrodes.

Deposition of organosilicon coatings from trimethylsilyl acetate and oxygen gases in capacitively coupled RF glow discharge

2020 ◽  
Vol 149 ◽  
pp. 105927
Author(s):  
Štěpánka Kelarová ◽  
Vojtěch Homola ◽  
Monika Stupavká ◽  
Martin Čermák ◽  
Jiří Vohánka ◽  
...  
Keyword(s):  
Glow Discharge ◽  
Capacitively Coupled ◽  
Rf Glow Discharge

Stabilized aqueous dispersion of multi-walled carbon nanotubes obtained by RF glow-discharge treatment

2009 ◽  
Vol 11 (7) ◽  
pp. 1817-1822 ◽  
Author(s):  
Leron Vandsburger ◽  
Edward J. Swanson ◽  
Jason Tavares ◽  
Jean-Luc Meunier ◽  
Sylvain Coulombe
Keyword(s):  
Carbon Nanotubes ◽  
Glow Discharge ◽  
Aqueous Dispersion ◽  
Discharge Treatment ◽  
Multi Walled Carbon Nanotubes ◽  
Rf Glow Discharge ◽  
Walled Carbon Nanotubes
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