Density of gap states in chemical‐vapor‐deposited hydrogenated amorphous silicon films

T. L. Chu; Shirley S. Chu; S. T. Ang; A. Duong; C. G. Hwuang

doi:10.1063/1.336889

Density of gap states in chemical‐vapor‐deposited hydrogenated amorphous silicon films

Journal of Applied Physics ◽

10.1063/1.336889 ◽

1986 ◽

Vol 59 (9) ◽

pp. 3122-3125 ◽

Cited By ~ 4

Author(s):

T. L. Chu ◽

Shirley S. Chu ◽

S. T. Ang ◽

A. Duong ◽

C. G. Hwuang

Keyword(s):

Amorphous Silicon ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

Silicon Films ◽

Chemical Vapor Deposited ◽

Gap States ◽

Hydrogenated Amorphous

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Surface passivation properties of boron-doped plasma-enhanced chemical vapor deposited hydrogenated amorphous silicon films on p-type crystalline Si substrates

Applied Physics Letters ◽

10.1063/1.2164902 ◽

2006 ◽

Vol 88 (2) ◽

pp. 022104 ◽

Cited By ~ 62

Author(s):

Stefaan De Wolf ◽

Guy Beaucarne

Keyword(s):

Amorphous Silicon ◽

Surface Passivation ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

Silicon Films ◽

Si Substrates ◽

Boron Doped ◽

Chemical Vapor Deposited ◽

P Type ◽

Hydrogenated Amorphous

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Reduced photoinduced degradation in chemical vapor deposited hydrogenated amorphous silicon films

Applied Physics Letters ◽

10.1063/1.99290 ◽

1988 ◽

Vol 52 (10) ◽

pp. 807-809 ◽

Cited By ~ 6

Author(s):

T. L. Chu ◽

Shirley S. Chu ◽

E. G. Bylander ◽

S. T. Ang

Keyword(s):

Amorphous Silicon ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

Silicon Films ◽

Chemical Vapor Deposited ◽

Hydrogenated Amorphous

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Effects of silicon–hydrogen bond characteristics on the crystallization of hydrogenated amorphous silicon films prepared by plasma enhanced chemical vapor deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.582049 ◽

1999 ◽

Vol 17 (6) ◽

pp. 3240-3245 ◽

Cited By ~ 21

Author(s):

Hae-Yeol Kim ◽

Jae-Beom Choi ◽

Jai-Young Lee

Keyword(s):

Hydrogen Bond ◽

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

Silicon Films ◽

Hydrogenated Amorphous ◽

Bond Characteristics

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The influence of hydrogen dilution ratio on the crystallization of hydrogenated amorphous silicon films prepared by plasma-enhanced chemical vapor deposition

Thin Solid Films ◽

10.1016/s0040-6090(96)09573-9 ◽

1997 ◽

Vol 302 (1-2) ◽

pp. 17-24 ◽

Cited By ~ 13

Author(s):

Hae-Yeol Kim ◽

Ki-Young Lee ◽

Jai-Young Lee

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

Silicon Films ◽

Dilution Ratio ◽

Hydrogen Dilution ◽

Hydrogenated Amorphous

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Laser-Induced Chemical Vapor Deposition (LCVD) of Hydrogenated Amorphous Silicon Films

Laser/Optoelektronik in der Technik / Laser/Optoelectronics in Engineering ◽

10.1007/978-3-642-48372-1_152 ◽

1990 ◽

pp. 713-716

Author(s):

P. González ◽

M. D. Fernández ◽

B. León ◽

M. Pérez-Amor

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

Silicon Films ◽

Hydrogenated Amorphous

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Spectroscopic Ellipsometry Studies on Ultrathin Hydrogenated Amorphous Silicon Films Prepared by Thermal Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.39.6196 ◽

2000 ◽

Vol 39 (Part 1, No. 11) ◽

pp. 6196-6201 ◽

Cited By ~ 3

Author(s):

Sukti Hazra ◽

Mitsuyuki Yamanaka ◽

Isao Sakata ◽

Toshiyuki Tsutsumi ◽

Tatsuro Maeda ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Spectroscopic Ellipsometry ◽

Vapor Deposition ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

Silicon Films ◽

Thermal Chemical Vapor Deposition ◽

Hydrogenated Amorphous

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Deposition of Cluster-Free B-doped Hydrogenated Amorphous Silicon Films Using SiH4+B10H14Multi-Hollow Discharge Plasma Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.7567/jjap.51.01ad03 ◽

2012 ◽

Vol 51 (1S) ◽

pp. 01AD03

Author(s):

Kazunori Koga ◽

Kenta Nakahara ◽

Yeon-Won Kim ◽

Takeaki Matsunaga ◽

Daisuke Yamashita ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Discharge Plasma ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

Silicon Films ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Hydrogenated Amorphous

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Rapid solid-phase crystallization of high-rate, hot-wire chemical-vapor-deposited hydrogenated amorphous silicon

Applied Physics Letters ◽

10.1063/1.2361163 ◽

2006 ◽

Vol 89 (16) ◽

pp. 161910 ◽

Cited By ~ 20

Author(s):

David L. Young ◽

Paul Stradins ◽

Yueqin Xu ◽

Lynn Gedvilas ◽

Bob Reedy ◽

...

Keyword(s):

Amorphous Silicon ◽

Solid Phase ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

High Rate ◽

Hot Wire ◽

Solid Phase Crystallization ◽

Chemical Vapor Deposited ◽

Hydrogenated Amorphous

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Photo-chemical vapor deposition of hydrogenated amorphous silicon films

Applied Physics B Photophysics and Laser Chemistry ◽

10.1007/bf00702661 ◽

1986 ◽

Vol 41 (2) ◽

pp. 103-108 ◽

Cited By ~ 5

Author(s):

N. Mutsukura ◽

Y. Machi

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

Silicon Films ◽

Hydrogenated Amorphous

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Oxidation study of plasma-enhanced chemical vapor deposited and rf sputtered hydrogenated amorphous silicon carbide films

Journal of Applied Physics ◽

10.1063/1.1330252 ◽

2001 ◽

Vol 89 (3) ◽

pp. 1942 ◽

Cited By ~ 8

Author(s):

W. K. Choi ◽

L. P. Lee ◽

S. L. Foo ◽

S. Gangadharan ◽

N. B. Chong ◽

...

Keyword(s):

Silicon Carbide ◽

Amorphous Silicon ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

Amorphous Silicon Carbide ◽

Oxidation Study ◽

Chemical Vapor Deposited ◽

Hydrogenated Amorphous

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