Measurement of spatially resolved gas‐phase plasma temperatures by optical emission and laser‐induced fluorescence spectroscopy

1983 ◽  
Vol 54 (6) ◽  
pp. 3080-3086 ◽  
Author(s):  
Glenn P. Davis ◽  
Richard A. Gottscho
Keyword(s):  
Fluorescence Spectroscopy ◽  
Gas Phase ◽  
Optical Emission ◽  
Laser Induced Fluorescence ◽  
Spatially Resolved

Studies of Plasma O Atom Concentration by Two-Photon Laser Induced Fluorescence and Optical Emission Spectroscopy

1984 ◽  
Vol 38 ◽  
Author(s):  
R. Walkup ◽  
K. Saenger ◽  
G. S. Selwyn
Keyword(s):  
Optical Emission ◽  
Quantitative Relationship ◽  
Laser Induced Fluorescence ◽  
Plasma Parameters ◽  
Atom Concentration ◽  
Rf Plasmas ◽  
Excited Atoms ◽  
Two Photon ◽  
Spatially Resolved ◽  
Quantitative Measurements

AbstractWe report quantitative measurements of the concentration of atomic oxygen in RF plasmas determined by two-photon laser induced fluorescence. The results are compared with concurrent measurements of spatially resolved plasma induced optical emission. These measurements establish: (1) the O atom concentration as a function of plasma parameters, (2) a semi-quantitative relationship between O* emission intensity normalized by Ar* in-tensity and O atom concentration, and (3) an understanding of the mechanisms for pro-duction of excited atoms in the plasma.

Laser Induced Fluorescence and Optical Emission Studies of Fluorocarbon Plasmas

1987 ◽  
Vol 98 ◽  
Author(s):  
J. P. Booth ◽  
C. Hancock ◽  
N. D. Perry ◽  
D. C. W. Blaikleye ◽  
J. A. Cairns ◽  
...  
Keyword(s):  
Gas Phase ◽  
Optical Emission Spectroscopy ◽  
Removal Rate ◽  
Dominant Role ◽  
Optical Emission ◽  
Laser Induced Fluorescence ◽  
Fluorocarbon Plasmas ◽  
Emission Studies ◽  
Phase Chemical ◽  
Surface Removal

ABSTRACTLaser induced fluorescence of CF2 has been observed in plasmas of CF4 and its mixtures with O2 and H2. Surface removal rates of the radical in pure CF4 were measured by observing the decay of the radical when the plasma is switched off. The reduction in CF2 concentration, and the increase in F atom concentrations (the latter measured by optical emission spectroscopy) on the addition of O2 is reproduced by a model of the plasma in which gas phase chemical reactions play a dominant role. The increase in CF2 concentration on the addition of H2 to a CF4 plasma is shown to be due to a reduction in the surface removal rate.

Spatial Generation Profiles of Active Radicals in Plasma-Enhanced CVD Of a-Si:H

1989 ◽  
Vol 165 ◽  
Author(s):  
D. Mataras ◽  
S. Cavadias ◽  
D. Rapakoulias
Keyword(s):  
Excited States ◽  
Ground State ◽  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Simultaneous Detection ◽  
Optical Emission ◽  
Laser Induced Fluorescence ◽  
Plasma Enhanced Cvd ◽  
Spatially Resolved ◽  
Kinetic Calculations

AbstractSpatially resolved Laser Induced Fluorescence and Optical Emission Spectroscopy were applied in an rf silane discharge, for the simultaneous detection of both ground and excited states of SiH radicals. Axial intensity profiles of these radicals were recorded under various conditions. The experimental observations indicate that the two radicals have different generation paths. LIF profiles are considered to represent the generation profile of all the ground state radicals and they were used as such in kinetic calculations.

The gas phase laser induced fluorescence spectroscopy of chlorofluoromethylene

1979 ◽  
Vol 71 (10) ◽  
pp. 4010-4014 ◽  
Author(s):  
S. E. Bialkowski ◽  
D. S. King ◽  
J. C. Stephenson
Keyword(s):  
Fluorescence Spectroscopy ◽  
Gas Phase ◽  
Laser Induced Fluorescence

Gas phase electronic spectrum of the HSCCS radical by laser-induced fluorescence spectroscopy

2005 ◽  
Vol 232 (2) ◽  
pp. 255-263 ◽  
Author(s):  
Masakazu Nakajima ◽  
Yu Yoneda ◽  
Hitomi Toyoshima ◽  
Yoshihiro Sumiyoshi ◽  
Yasuki Endo
Keyword(s):  
Fluorescence Spectroscopy ◽  
Electronic Spectrum ◽  
Gas Phase ◽  
Laser Induced Fluorescence
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