High-rate reactive ion etching of barium hexaferrite films using optimal CHF3/SF6 gas mixtures

2009 ◽  
Vol 94 (11) ◽  
pp. 112505 ◽  
Author(s):  
Zhaohui Chen ◽  
Aria Yang ◽  
Changqing Xie ◽  
Qinghua Yang ◽  
C. Vittoria ◽  
...  
Keyword(s):  
Reactive Ion Etching ◽  
Barium Hexaferrite ◽  
Gas Mixtures ◽  
High Rate ◽  
Ion Etching

Reactive Ion Etching of Silicon Trenches Using  SF 6 /  O 2 Gas Mixtures

1991 ◽  
Vol 138 (10) ◽  
pp. 3076-3081 ◽  
Author(s):  
Tsengyou Syau ◽  
B. Jayant Baliga ◽  
Raymond W. Hamaker
Keyword(s):  
Reactive Ion Etching ◽  
Gas Mixtures ◽  
Ion Etching ◽  
Silicon Trenches

High rate reactive ion etching of Al2O3 and Si

1980 ◽  
Vol 17 (3) ◽  
pp. 731-734 ◽  
Author(s):  
Neil Heiman ◽  
Vincent Minkiewicz ◽  
Brian Chapman
Keyword(s):  
Reactive Ion Etching ◽  
High Rate ◽  
Ion Etching

Reactive Ion Etching in  SF 6 Gas Mixtures

1987 ◽  
Vol 134 (1) ◽  
pp. 165-175 ◽  
Author(s):  
R. Pinto ◽  
K. V. Ramanathan ◽  
R. S. Babu
Keyword(s):  
Reactive Ion Etching ◽  
Gas Mixtures ◽  
Ion Etching
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