Evaluation of integrity and barrier performance of atomic layer deposited WNxCy films on plasma enhanced chemical vapor deposited SiO2 for Cu metallization
Keyword(s):
1995 ◽
Vol 34
(Part 1, No. 12B)
◽
pp. 6857-6860
◽
Keyword(s):
2003 ◽
Vol 163-164
◽
pp. 214-219
◽
Keyword(s):
Keyword(s):
2018 ◽
Vol 33
(4)
◽
pp. 045004
◽
2000 ◽
Vol 18
(1)
◽
pp. 242
◽
1999 ◽
Vol 146
(10)
◽
pp. 3724-3730
◽
Keyword(s):
2017 ◽
Vol 56
(8S2)
◽
pp. 08MB01
◽
Keyword(s):
2010 ◽
Vol 157
(2)
◽
pp. G62
◽
Keyword(s):