Relation between the CF2 radical and plasma density measured using LIF and cutoff probe in a CF4 inductively coupled plasma

Jung-Hyung Kim; Yong-Hyeon Shin; Kwang-Hwa Chung; Yong-Shim Yoo

doi:10.1063/1.1788880

Relation between the CF2 radical and plasma density measured using LIF and cutoff probe in a CF4 inductively coupled plasma

Applied Physics Letters ◽

10.1063/1.1788880 ◽

2004 ◽

Vol 85 (11) ◽

pp. 1922-1924 ◽

Cited By ~ 5

Author(s):

Jung-Hyung Kim ◽

Yong-Hyeon Shin ◽

Kwang-Hwa Chung ◽

Yong-Shim Yoo

Keyword(s):

Plasma Density ◽

Inductively Coupled Plasma ◽

Inductively Coupled

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Evolution of Two-Dimensional Plasma Density on the E–H Heating-Mode Transition in Planar-Type Inductively Coupled Plasma

IEEE Transactions on Plasma Science ◽

10.1109/tps.2011.2135382 ◽

2011 ◽

Vol 39 (11) ◽

pp. 2536-2537 ◽

Cited By ~ 8

Author(s):

Hyo-Chang Lee ◽

Young-Cheol Kim ◽

Chin-Wook Chung

Keyword(s):

Plasma Density ◽

Inductively Coupled Plasma ◽

Mode Transition ◽

Two Dimensional ◽

Inductively Coupled ◽

Heating Mode

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Nonlinear enhancement of plasma density in linear combination of multiple collisional internal inductively coupled plasma sources

Physics of Plasmas ◽

10.1063/1.3486200 ◽

2010 ◽

Vol 17 (10) ◽

pp. 103503 ◽

Cited By ~ 4

Author(s):

Zhipeng Chen ◽

Hong Li ◽

Bin Li ◽

Chen Luo ◽

Jinlin Xie ◽

...

Keyword(s):

Linear Combination ◽

Plasma Density ◽

Inductively Coupled Plasma ◽

Plasma Sources ◽

Inductively Coupled

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Effect of the RF bias on the plasma density in an argon inductively coupled plasma

Physics of Plasmas ◽

10.1063/5.0015555 ◽

2020 ◽

Vol 27 (9) ◽

pp. 093508

Author(s):

Ho-won Lee ◽

Kyung-Hyun Kim ◽

Jong In Seo ◽

Chin-Wook Chung

Keyword(s):

Plasma Density ◽

Inductively Coupled Plasma ◽

Inductively Coupled

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Compensation for transient chamber wall condition using real-time plasma density feedback control in an inductively coupled plasma etcher

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.1569921 ◽

2003 ◽

Vol 21 (3) ◽

pp. 706-717 ◽

Cited By ~ 20

Author(s):

Pete I. Klimecky ◽

J. W. Grizzle ◽

Fred L. Terry

Keyword(s):

Feedback Control ◽

Real Time ◽

Plasma Density ◽

Inductively Coupled Plasma ◽

Chamber Wall ◽

Inductively Coupled ◽

Wall Condition

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Influence of heat and particle fluxes nonlocality on spatial distribution of plasma density in two-chamber inductively coupled plasma sources

Physics of Plasmas ◽

10.1063/1.4731734 ◽

2012 ◽

Vol 19 (7) ◽

pp. 073504 ◽

Cited By ~ 6

Author(s):

A. A. Kudryavtsev ◽

K. Yu. Serditov

Keyword(s):

Spatial Distribution ◽

Plasma Density ◽

Inductively Coupled Plasma ◽

Plasma Sources ◽

Inductively Coupled ◽

Particle Fluxes

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Effect of bias application to plasma density in weakly magnetized inductively coupled plasma

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.4804136 ◽

2013 ◽

Vol 31 (4) ◽

pp. 041301 ◽

Cited By ~ 4

Author(s):

Hyuk Kim ◽

Woohyun Lee ◽

Wanjae Park ◽

Ki-Woong Whang

Keyword(s):

Plasma Density ◽

Inductively Coupled Plasma ◽

Inductively Coupled

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Development of in-situ plasma density monitoring method in inductively coupled plasma

The 30th International Conference on Plasma Science, 2003. ICOPS 2003. IEEE Conference Record - Abstracts. ◽

10.1109/plasma.2003.1228661 ◽

2003 ◽

Author(s):

Jung-Hyun Cho ◽

Min-Joong Jung ◽

Gon-Ho Kim

Keyword(s):

Plasma Density ◽

Inductively Coupled Plasma ◽

Monitoring Method ◽

Inductively Coupled

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Measurement of Plasma Density for Control of Etching Profile in Inductively Coupled Plasma Etching of InP

Japanese Journal of Applied Physics ◽

10.1143/jjap.41.3147 ◽

2002 ◽

Vol 41 (Part 1, No. 5A) ◽

pp. 3147-3148 ◽

Cited By ~ 4

Author(s):

Akihiro Matsutani ◽

Hideo Ohtsuki ◽

Fumio Koyama ◽

Kenichi Iga

Keyword(s):

Plasma Density ◽

Plasma Etching ◽

Inductively Coupled Plasma ◽

Inductively Coupled Plasma Etching ◽

Inductively Coupled ◽

Etching Profile

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Control of plasma density distribution via wireless power transfer in an inductively coupled plasma

Plasma Sources Science and Technology ◽

10.1088/0963-0252/22/3/032002 ◽

2013 ◽

Vol 22 (3) ◽

pp. 032002 ◽

Cited By ~ 3

Author(s):

Hee-Jin Lee ◽

Hyo-Chang Lee ◽

Young-Cheol Kim ◽

Chin-Wook Chung

Keyword(s):

Density Distribution ◽

Plasma Density ◽

Inductively Coupled Plasma ◽

Wireless Power Transfer ◽

Power Transfer ◽

Wireless Power ◽

Inductively Coupled ◽

Plasma Density Distribution

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In-Situ Method of Monitoring Argon Plasma Density Variation Using Current and Voltage of Flat Antenna in Inductively Coupled Plasma Source

Contributions to Plasma Physics ◽

10.1002/ctpp.200610021 ◽

2006 ◽

Vol 46 (5-6) ◽

pp. 399-405 ◽

Cited By ~ 2

Author(s):

S.-H. Lee ◽

J.-H. Cho ◽

G.-H. Kim

Keyword(s):

Plasma Density ◽

Inductively Coupled Plasma ◽

Argon Plasma ◽

Plasma Source ◽

Density Variation ◽

Inductively Coupled ◽

In Situ Method

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