In-Situ Method of Monitoring Argon Plasma Density Variation Using Current and Voltage of Flat Antenna in Inductively Coupled Plasma Source
2006 ◽
Vol 46
(5-6)
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pp. 399-405
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2002 ◽
Vol 20
(5)
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pp. 1566-1573
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2008 ◽
Vol 63
(7)
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pp. 777-783
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2014 ◽
Vol 85
(1)
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pp. 013510
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1983 ◽
Vol 2
(10)
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pp. 225-230
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