Depth profile of concentration of deep‐level impurities in vapor‐phase epitaxial gallium‐arsenide grown under various arsenic vapor pressures

1973 ◽  
Vol 44 (3) ◽  
pp. 1316-1326 ◽  
Author(s):  
Hiroshi Okamoto ◽  
Seizo Sakata ◽  
Kazuo Sakai
Author(s):  
Nataliya Mitina ◽  
Vladimir Krylov

The results of an experiment to determine the activation energy of a deep level in a gallium arsenide mesastructure, obtained by the method of capacitive deep levels transient spectroscopy with data processing according to the Oreshkin model and Lang model, are considered.


Author(s):  
Aleksey Bogachev ◽  
Vladimir Krylov

The results of an experiment to determine the activation energy of a deep level in a gallium arsenide mesastructure by capacitive relaxation spectroscopy of deep levels at various values of the blocking voltage are considered.


2016 ◽  
Vol 52 (10) ◽  
pp. 985-989 ◽  
Author(s):  
P. B. Boldyrevskii ◽  
D. O. Filatov ◽  
I. A. Kazantseva ◽  
D. S. Smotrin ◽  
M. V. Revin

1993 ◽  
Vol 301 ◽  
Author(s):  
Achim DÖrnen ◽  
Klaus Pressel ◽  
Christoph Hiller ◽  
Dieter Haase ◽  
JÜrgen Weber ◽  
...  

ABSTRACTWe investigate the excitation mechanism of the characteristic 4f luminescence 3H5 →3H6 of Tm3+ in GaAs by photoluminescence excitation spectroscopy. This luminescence transition is also used to study the incorporation of thulium into the GaAs lattice by angular dependent Zeeman spectroscopy.


1993 ◽  
Vol 46 (3) ◽  
pp. 435
Author(s):  
C Jagadish ◽  
A Clark ◽  
G Li ◽  
CA Larson ◽  
N Hauser ◽  
...  

Undoped and doped layers of gallium arsenide and aluminium gallium arsenide have been grown on gallium arsenide by low-pressure metal organic vapour-phase epitaxy (MOVPE). Delta doping and growth on silicon substrates have also been attempted. Of particular interest in the present study has been the influence of growth parameters, such as growth temperature, group III mole fraction and dopant flow, on the electrical and physical properties of gallium arsenide layers. An increase in growth temperature leads to increased doping efficiency in the case of silicon, whereas the opposite is true in the case of zinc. Deep level transient spectroscopy (DTLS) studies on undoped GaAs layers showed two levels, the expected EL2 level and a carbon-related level. The determination of optimum growth conditions has allowed good quality GaAs and AlGaAs epitaxial layers to be produced for a range of applications.`


1996 ◽  
Vol 449 ◽  
Author(s):  
H. Siegle ◽  
A. Hoffmann ◽  
L. Eckey ◽  
C. Thomsen ◽  
T. Detchprohm ◽  
...  

ABSTRACTWe present results of spatially-resolved photoluminescence and Raman measurements on a 200 μm thick GaN layer grown on sapphire by hydride vapor phase epitaxy. Our microphotoluminescence measurements reveal that the peak position of the excitonic and donoracceptor-pair transitions strongly depends on the distance to the substrate interface. We observed a strong blue shift near the interface and discuss the influence of strain, which we quantified by micro-Raman experiments.


2019 ◽  
Vol 10 (1) ◽  
Author(s):  
Wondwosen Metaferia ◽  
Kevin L. Schulte ◽  
John Simon ◽  
Steve Johnston ◽  
Aaron J. Ptak

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