scholarly journals Rapid thermally annealed plasma deposited SiNx:H thin films: Application to metal–insulator–semiconductor structures with Si, In0.53Ga0.47As, and InP

2003 ◽  
Vol 94 (4) ◽  
pp. 2642-2653 ◽  
Author(s):  
I. Mártil ◽  
A. del Prado ◽  
E. San Andrés ◽  
G. González Dı́az ◽  
F. L. Martı́nez
2004 ◽  
Vol 38 (12) ◽  
pp. 1390-1393
Author(s):  
V. A. Terekhov ◽  
A. N. Man’ko ◽  
E. N. Bormontov ◽  
V. N. Levchenko ◽  
S. Yu. Trebunskikh ◽  
...  

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