Improved model for the stress-induced leakage current in thin silicon dioxide based on conduction-band electron and valence-band electron tunneling

2002 ◽  
Vol 91 (3) ◽  
pp. 1577-1588 ◽  
Author(s):  
W. K. Chim ◽  
P. S. Lim
1999 ◽  
Vol 567 ◽  
Author(s):  
S. Okhonin ◽  
A. Ils ◽  
D. Bouvet ◽  
P. Fazan ◽  
G. Guegan ◽  
...  

ABSTRACTThe conduction band and valence band electron tunneling currents in ultra-thin SiO2 films at the transition from direct to Fowler-Nordheim tunneling regimes are studied. The slopes of the current voltage characteristics agree well with the simulations performed. The Stress-Induced Leakage Current (SILC) behavior is quite similar for both conduction and valence band currents even if the amplitude of the valence band SILC is much lower. We show that a linear dependence exists between the stress-induced interface trap density and both valence and conduction band SILC. A new model of SILC is also proposed.


2005 ◽  
Vol 52 (9) ◽  
pp. 2061-2066 ◽  
Author(s):  
J.-W. Wu ◽  
J.-W. You ◽  
H.-C. Ma ◽  
C.-C. Cheng ◽  
C.-F. Hsu ◽  
...  

2007 ◽  
Vol 54 (2) ◽  
pp. 316-322 ◽  
Author(s):  
W. Wu ◽  
Xin Li ◽  
G. Gildenblat ◽  
G.O. Workman ◽  
S. Veeraraghavan ◽  
...  

1999 ◽  
Vol 48 (1-4) ◽  
pp. 295-298 ◽  
Author(s):  
A. Shanware ◽  
H.Z. Massoud ◽  
E. Vogel ◽  
K. Henson ◽  
J.R. Hauser ◽  
...  

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