Improved model for the stress-induced leakage current in thin silicon dioxide based on conduction-band electron and valence-band electron tunneling
Excess Low-Frequency Noise in Ultrathin Oxide n-MOSFETs Arising From Valence-Band Electron Tunneling
2005 ◽
Vol 52
(9)
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pp. 2061-2066
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1987 ◽
Vol 30
(1-4)
◽
pp. 298-303
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Keyword(s):
2007 ◽
Vol 54
(2)
◽
pp. 316-322
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Keyword(s):
1999 ◽
Vol 48
(1-4)
◽
pp. 295-298
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Keyword(s):
Keyword(s):