Low-loss polymeric optical waveguides using electron-beam direct writing

2001 ◽  
Vol 78 (15) ◽  
pp. 2110-2112 ◽  
Author(s):  
W. H. Wong ◽  
J. Zhou ◽  
E. Y. B. Pun
Keyword(s):  
Electron Beam ◽  
Optical Waveguides ◽  
Direct Writing ◽  
Low Loss

Direct Writing of Gratings by Electron Beam in Poly(metyl methacrylate) Optical Waveguides

1979 ◽  
Vol 18 (2) ◽  
pp. 279-283 ◽  
Author(s):  
Hideo Kotani ◽  
Mitsuo Kawabe ◽  
Susumu Namba
Keyword(s):  
Electron Beam ◽  
Optical Waveguides ◽  
Direct Writing

SAW DEVICE BEYOND 5 GHz

2000 ◽  
Vol 10 (04) ◽  
pp. 1111-1142
Author(s):  
HIROYUKI ODAGAWA ◽  
KAZUHIKO YAMANOUCHI
Keyword(s):  
Electron Beam ◽  
High Frequency ◽  
Wide Band ◽  
Direct Writing ◽  
Fabrication Technology ◽  
Low Loss ◽  
Propagation Property ◽  
Band Filter ◽  
5 Ghz

Here we describe recent high frequency SAW technology based on ultra-fine fabrication techniques using electron beam (EB) exposure direct writing and low-loss wide-band filter applications beyond 5 GHz. We especially consider the propagation property of SAWs in the 10 GHz range, which is important for low-loss characteristics, the fabrication technology, and some examples of low-loss filters using unidirectional transducers and ladder type SAW filters.

scholarly journals Characterization of benzocyclobutene optical waveguides fabricated by electron-beam direct writing

2004 ◽  
Vol 42 (3) ◽  
pp. 208-210 ◽  
Author(s):  
Chih-Wei Hsu ◽  
Hsuen-Li Chen ◽  
Wen-Chi Chao ◽  
Way-Seen Wang
Keyword(s):  
Electron Beam ◽  
Optical Waveguides ◽  
Direct Writing

Direct-Writing of Cu Nano-Patterns with an Electron Beam

2015 ◽  
Vol 21 (6) ◽  
pp. 1639-1643 ◽  
Author(s):  
Shih-En Lai ◽  
Ying-Jhan Hong ◽  
Yu-Ting Chen ◽  
Yu-Ting Kang ◽  
Pin Chang ◽  
...  
Keyword(s):  
Electron Beam ◽  
Exposure Time ◽  
Metal Ion ◽  
Reduction Rate ◽  
Industrial Applications ◽  
Growth Stages ◽  
Sample Holder ◽  
Direct Writing ◽  
Transmission Electron ◽  
Aqueous Layer

AbstractWe demonstrate direct electron beam writing of a nano-scale Cu pattern on a surface with a thin aqueous layer of CuSO4 solution. Electron beams are highly maneuverable down to nano-scales. Aqueous solutions facilitate a plentiful metal ion supply for practical industrial applications, which may require continued reliable writing of sophisticated patterns. A thin aqueous layer on a surface helps to confine the writing on the surface. For this demonstration, liquid sample holder (K-kit) for transmission electron microscope (TEM) was employed to form a sealed space in a TEM. The aqueous CuSO4 solution inside the sample holder was allowed to partially dry until a uniform thin layer was left on the surface. The electron beam thus reduced Cu ions in the solution to form the desired patterns. Furthermore, the influence of e-beam exposure time and CuSO4(aq) concentration on the Cu reduction was studied in this work. Two growth stages of Cu were shown in the plot of Cu thickness versus e-beam exposure time. The measured Cu reduction rate was found to be proportional to the CuSO4(aq) concentration.

scholarly journals Direct writing of CoFe alloy nanostructures by focused electron beam induced deposition from a heteronuclear precursor

2015 ◽  
Vol 26 (47) ◽  
pp. 475701 ◽  
Author(s):  
F Porrati ◽  
M Pohlit ◽  
J Müller ◽  
S Barth ◽  
F Biegger ◽  
...  
Keyword(s):  
Electron Beam ◽  
Direct Writing ◽  
Alloy Nanostructures ◽  
Electron Beam Induced Deposition
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