Single-mode polymer optical waveguides fabricated by electron beam direct writing

2004 ◽  
Author(s):  
C. W. Hsu ◽  
W. S. Wang ◽  
H. L. Chen ◽  
W. C. Chao
Keyword(s):  
Electron Beam ◽  
Optical Waveguides ◽  
Single Mode ◽  
Direct Writing

Low-loss polymeric optical waveguides using electron-beam direct writing

2001 ◽  
Vol 78 (15) ◽  
pp. 2110-2112 ◽  
Author(s):  
W. H. Wong ◽  
J. Zhou ◽  
E. Y. B. Pun
Keyword(s):  
Electron Beam ◽  
Optical Waveguides ◽  
Direct Writing ◽  
Low Loss

Investigations on Integrated Optical Interference Couplers in PMMA for Visible and Infrared Range Fabricated by “Direct Writing” Excimer Laser Radiation

2019 ◽  
Vol 40 (2) ◽  
pp. 149-160
Author(s):  
Humza Mirza ◽  
Bin Wu ◽  
Sabine Tiedeken ◽  
Volker Braun ◽  
Hans Josef Brückner ◽  
...  
Keyword(s):  
Laser Radiation ◽  
Excimer Laser ◽  
Optical Waveguides ◽  
Near Field ◽  
Single Mode ◽  
Structure Design ◽  
Infrared Range ◽  
Direct Writing ◽  
Direct Laser ◽  
Excimer Laser Radiation

Abstract Optical waveguides were generated in Polymethylmethacrylate using “direct” laser and contact mask structuring. Excimer laser radiation (248 nm) produced a local refractive index increase thereby achieving light guiding in waveguides with widths from 2 to 15 $\mu$m. The near field output images were analyzed using visible and infrared laser light. The mode fields of single mode structures were evaluated to elaborate numerically the parameters of the index profile. An index increase up to 0.01 could be achieved using laser pulses at fluences below $0.15$ ${\textrm{J/cm}^{2}}$. Thus it was possible to design interference couplers of 5 $\mu$m waveguides width for the visible (635 nm to 670 nm) as well as for the infrared range at 1550 nm. The coupling properties as a function of the waveguide separation and the wavelength is investigated and found compatible with numerical simulations for the structure design. The presented approach allows for designing and fabricating single mode couplers in an efficient and simple manner.

Direct Writing of Gratings by Electron Beam in Poly(metyl methacrylate) Optical Waveguides

1979 ◽  
Vol 18 (2) ◽  
pp. 279-283 ◽  
Author(s):  
Hideo Kotani ◽  
Mitsuo Kawabe ◽  
Susumu Namba
Keyword(s):  
Electron Beam ◽  
Optical Waveguides ◽  
Direct Writing

scholarly journals Characterization of benzocyclobutene optical waveguides fabricated by electron-beam direct writing

2004 ◽  
Vol 42 (3) ◽  
pp. 208-210 ◽  
Author(s):  
Chih-Wei Hsu ◽  
Hsuen-Li Chen ◽  
Wen-Chi Chao ◽  
Way-Seen Wang
Keyword(s):  
Electron Beam ◽  
Optical Waveguides ◽  
Direct Writing

Laser Direct Writing of Single-Mode Polysiloxane Optical Waveguides and Devices

2014 ◽  
Vol 32 (17) ◽  
pp. 3036-3042 ◽  
Author(s):  
Eugen Zgraggen ◽  
Ibrahim Murat Soganci ◽  
Folkert Horst ◽  
Antonio La Porta ◽  
Roger Dangel ◽  
...  
Keyword(s):  
Optical Waveguides ◽  
Single Mode ◽  
Direct Writing ◽  
Laser Direct Writing

GaAs/AlGaAs single‐mode optical waveguides with low propagation loss and strong optical confinement

1990 ◽  
Vol 56 (11) ◽  
pp. 990-992 ◽  
Author(s):  
M. Seto ◽  
A. Shahar ◽  
R. J. Deri ◽  
W. J. Tomlinson ◽  
A. Yi‐Yan
Keyword(s):  
Optical Waveguides ◽  
Single Mode ◽  
Propagation Loss ◽  
Optical Confinement

Direct-Writing of Cu Nano-Patterns with an Electron Beam

2015 ◽  
Vol 21 (6) ◽  
pp. 1639-1643 ◽  
Author(s):  
Shih-En Lai ◽  
Ying-Jhan Hong ◽  
Yu-Ting Chen ◽  
Yu-Ting Kang ◽  
Pin Chang ◽  
...  
Keyword(s):  
Electron Beam ◽  
Exposure Time ◽  
Metal Ion ◽  
Reduction Rate ◽  
Industrial Applications ◽  
Growth Stages ◽  
Sample Holder ◽  
Direct Writing ◽  
Transmission Electron ◽  
Aqueous Layer

AbstractWe demonstrate direct electron beam writing of a nano-scale Cu pattern on a surface with a thin aqueous layer of CuSO4 solution. Electron beams are highly maneuverable down to nano-scales. Aqueous solutions facilitate a plentiful metal ion supply for practical industrial applications, which may require continued reliable writing of sophisticated patterns. A thin aqueous layer on a surface helps to confine the writing on the surface. For this demonstration, liquid sample holder (K-kit) for transmission electron microscope (TEM) was employed to form a sealed space in a TEM. The aqueous CuSO4 solution inside the sample holder was allowed to partially dry until a uniform thin layer was left on the surface. The electron beam thus reduced Cu ions in the solution to form the desired patterns. Furthermore, the influence of e-beam exposure time and CuSO4(aq) concentration on the Cu reduction was studied in this work. Two growth stages of Cu were shown in the plot of Cu thickness versus e-beam exposure time. The measured Cu reduction rate was found to be proportional to the CuSO4(aq) concentration.

scholarly journals Direct writing of CoFe alloy nanostructures by focused electron beam induced deposition from a heteronuclear precursor

2015 ◽  
Vol 26 (47) ◽  
pp. 475701 ◽  
Author(s):  
F Porrati ◽  
M Pohlit ◽  
J Müller ◽  
S Barth ◽  
F Biegger ◽  
...  
Keyword(s):  
Electron Beam ◽  
Direct Writing ◽  
Alloy Nanostructures ◽  
Electron Beam Induced Deposition

Development of single-layer positive resist process for electron beam direct writing technology

1995 ◽  
Vol 78 (8) ◽  
pp. 81-91 ◽  
Author(s):  
Hidenori Yamaguchi ◽  
Toshio Sakamizu ◽  
Fumio Murai ◽  
Hiroshi Shiraishi ◽  
Hajime Hayakawa ◽  
...  
Keyword(s):  
Electron Beam ◽  
Single Layer ◽  
Direct Writing ◽  
Writing Technology ◽  
Positive Resist
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