Model-based lithography verification system for multilayer structure in electron-beam direct writing

2006 ◽  
Author(s):  
Kozo Ogino ◽  
Hiromi Hoshino ◽  
Yasuhide Machida
Keyword(s):  
Electron Beam ◽  
Multilayer Structure ◽  
Direct Writing ◽  
Model Based ◽  
Verification System

Direct-Writing of Cu Nano-Patterns with an Electron Beam

2015 ◽  
Vol 21 (6) ◽  
pp. 1639-1643 ◽  
Author(s):  
Shih-En Lai ◽  
Ying-Jhan Hong ◽  
Yu-Ting Chen ◽  
Yu-Ting Kang ◽  
Pin Chang ◽  
...  
Keyword(s):  
Electron Beam ◽  
Exposure Time ◽  
Metal Ion ◽  
Reduction Rate ◽  
Industrial Applications ◽  
Growth Stages ◽  
Sample Holder ◽  
Direct Writing ◽  
Transmission Electron ◽  
Aqueous Layer

AbstractWe demonstrate direct electron beam writing of a nano-scale Cu pattern on a surface with a thin aqueous layer of CuSO4 solution. Electron beams are highly maneuverable down to nano-scales. Aqueous solutions facilitate a plentiful metal ion supply for practical industrial applications, which may require continued reliable writing of sophisticated patterns. A thin aqueous layer on a surface helps to confine the writing on the surface. For this demonstration, liquid sample holder (K-kit) for transmission electron microscope (TEM) was employed to form a sealed space in a TEM. The aqueous CuSO4 solution inside the sample holder was allowed to partially dry until a uniform thin layer was left on the surface. The electron beam thus reduced Cu ions in the solution to form the desired patterns. Furthermore, the influence of e-beam exposure time and CuSO4(aq) concentration on the Cu reduction was studied in this work. Two growth stages of Cu were shown in the plot of Cu thickness versus e-beam exposure time. The measured Cu reduction rate was found to be proportional to the CuSO4(aq) concentration.

scholarly journals Direct writing of CoFe alloy nanostructures by focused electron beam induced deposition from a heteronuclear precursor

2015 ◽  
Vol 26 (47) ◽  
pp. 475701 ◽  
Author(s):  
F Porrati ◽  
M Pohlit ◽  
J Müller ◽  
S Barth ◽  
F Biegger ◽  
...  
Keyword(s):  
Electron Beam ◽  
Direct Writing ◽  
Alloy Nanostructures ◽  
Electron Beam Induced Deposition

Development of single-layer positive resist process for electron beam direct writing technology

1995 ◽  
Vol 78 (8) ◽  
pp. 81-91 ◽  
Author(s):  
Hidenori Yamaguchi ◽  
Toshio Sakamizu ◽  
Fumio Murai ◽  
Hiroshi Shiraishi ◽  
Hajime Hayakawa ◽  
...  
Keyword(s):  
Electron Beam ◽  
Single Layer ◽  
Direct Writing ◽  
Writing Technology ◽  
Positive Resist

Submicrometer Electron-Beam Direct Writing Technology for 1-Mbit DRAM Fabrication

1985 ◽  
Vol 20 (1) ◽  
pp. 88-93 ◽  
Author(s):  
T. Matsuda ◽  
K. Miyoshi ◽  
R. Yamaguchi ◽  
S. Moriya ◽  
T. Hosoya ◽  
...  
Keyword(s):  
Electron Beam ◽  
Direct Writing ◽  
Writing Technology

Low-loss polymeric optical waveguides using electron-beam direct writing

2001 ◽  
Vol 78 (15) ◽  
pp. 2110-2112 ◽  
Author(s):  
W. H. Wong ◽  
J. Zhou ◽  
E. Y. B. Pun
Keyword(s):  
Electron Beam ◽  
Optical Waveguides ◽  
Direct Writing ◽  
Low Loss

Model-based proximity effect correction for electron-beam direct-write lithography

2010 ◽  
Author(s):  
Chun-Hung Liu ◽  
Pei-Lin Tien ◽  
Philip C. W. Ng ◽  
Yu-Tian Shen ◽  
Kuen-Yu Tsai
Keyword(s):  
Electron Beam ◽  
Proximity Effect ◽  
Direct Write ◽  
Model Based ◽  
Proximity Effect Correction

Electron Beam Direct Writing technology for LSI prototyping business

2010 ◽  
Vol 87 (5-8) ◽  
pp. 1131-1134 ◽  
Author(s):  
Yasuhide Machida ◽  
Takashi Maruyama ◽  
Yoshinori Kojima ◽  
Shinji Sugatani ◽  
Haruo Tsuchikawa ◽  
...  
Keyword(s):  
Electron Beam ◽  
Direct Writing ◽  
Writing Technology

Optimization of chemically amplified resist for high-volume manufacturing by electron-beam direct writing toward 14nm node and beyond

2012 ◽  
Author(s):  
Jun-ichi Kon ◽  
Takashi Maruyama ◽  
Yoshinori Kojima ◽  
Yasushi Takahashi ◽  
Shinji Sugatani ◽  
...  
Keyword(s):  
Electron Beam ◽  
High Volume ◽  
Direct Writing ◽  
Chemically Amplified ◽  
Chemically Amplified Resist
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