Low-energy electron-beam patterning of amine-functionalized self-assembled monolayers

2000 ◽  
Vol 76 (17) ◽  
pp. 2466-2468 ◽  
Author(s):  
C. K. Harnett ◽  
K. M. Satyalakshmi ◽  
H. G. Craighead
Keyword(s):  
Electron Beam ◽  
Low Energy ◽  
Energy Electron ◽  
Self Assembled Monolayers ◽  
Amine Functionalized ◽  
Assembled Monolayers ◽  
Low Energy Electron ◽  
Self Assembled ◽  
Electron Beam Patterning

Low-energy electron irradiation induced synthesis of molecular nanosheets: influence of the electron beam energy

2021 ◽  
Author(s):  
Christof Neumann ◽  
Richard A. Wilhelm ◽  
Maria Küllmer ◽  
Andrey Turchanin
Keyword(s):  
Electron Beam ◽  
Electron Irradiation ◽  
Beam Energy ◽  
Low Energy ◽  
Energy Electron ◽  
Electron Beam Energy ◽  
Low Energy Electron ◽  
Self Assembled

Electron irradiation induced synthesis of molecular nanosheets from aromatic self-assembled reveals different mechanisms depending on the applied beam energy.

Self-Assembled Monolayers as High-Resolution Etch Masks and Templates for Organic Molecular Assembly

2000 ◽  
Vol 636 ◽  
Author(s):  
C. K. Harnett ◽  
A. G. Lopez ◽  
K. M. Satyalakshmi ◽  
Y.-F. Chen ◽  
H. G. Craighead
Keyword(s):  
Electron Beam ◽  
High Resolution ◽  
Molecular Assembly ◽  
Single Step ◽  
Self Assembled Monolayers ◽  
Organic Chemical ◽  
Organic Systems ◽  
Assembled Monolayers ◽  
Self Assembled ◽  
Electron Beam Patterning

AbstractWe have used a variety of self-assembled monolayers as resists for low energy electron beam patterning. These compounds can be used as high-resolution patternable linker molecules for selected area binding of proteins and other organic compounds, as well as nanoparticles with organic chemical coatings. Because these systems can be aligned in registry to existing patterns, the organic systems may be positioned with the accuracy of electron-beam lithography. We have also explored the use of self-assembled monolayers for the creation of sub-wavelength artificial dielectric systems. The ultra-thin patterned monolayer is combined with a contrast-enhancing etch process to create high aspect ratio structures. This technique can be used to fabricate diffractive optical devices in a single-step process.

Improved electron‐beam patterning of Si with self‐assembled monolayers

1996 ◽  
Vol 69 (27) ◽  
pp. 4245-4247 ◽  
Author(s):  
C. S. Whelan ◽  
M. J. Lercel ◽  
H. G. Craighead ◽  
K. Seshadri ◽  
D. L. Allara
Keyword(s):  
Electron Beam ◽  
Self Assembled Monolayers ◽  
Assembled Monolayers ◽  
Self Assembled ◽  
Electron Beam Patterning
Sign in / Sign up

Export Citation Format

Share Document