Formation and Characterization of Self-assembled Monolayers of Octadecyltrimethoxysilane on Chromium:  Application in Low-Energy Electron Lithography

Langmuir ◽  
1998 ◽  
Vol 14 (2) ◽  
pp. 342-346 ◽  
Author(s):  
R. Hild ◽  
C. David ◽  
H. U. Müller ◽  
B. Völkel ◽  
D. R. Kayser ◽  
...  
2009 ◽  
Vol 25 (1) ◽  
pp. 83-86 ◽  
Author(s):  
Guo-Qiang TAN ◽  
Hai-Yang BO ◽  
Hong-Yan MIAO ◽  
Ao XIA ◽  
Zhong-Liang HE

Langmuir ◽  
2017 ◽  
Vol 33 (25) ◽  
pp. 6419-6426 ◽  
Author(s):  
A. Shaheen ◽  
J. M. Sturm ◽  
R. Ricciardi ◽  
J. Huskens ◽  
C. J. Lee ◽  
...  

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