Effects of hydrogen surface pretreatment of silicon dioxide on the nucleation and surface roughness of polycrystalline silicon films prepared by rapid thermal chemical vapor deposition

Y. Z. Hu; C. Y. Zhao; C. Basa; W. X. Gao; E. A. Irene

doi:10.1063/1.118148

Effects of hydrogen surface pretreatment of silicon dioxide on the nucleation and surface roughness of polycrystalline silicon films prepared by rapid thermal chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.118148 ◽

1996 ◽

Vol 69 (4) ◽

pp. 485-487 ◽

Cited By ~ 23

Author(s):

Y. Z. Hu ◽

C. Y. Zhao ◽

C. Basa ◽

W. X. Gao ◽

E. A. Irene

Keyword(s):

Surface Roughness ◽

Chemical Vapor Deposition ◽

Silicon Dioxide ◽

Vapor Deposition ◽

Polycrystalline Silicon ◽

Chemical Vapor ◽

Silicon Films ◽

Surface Pretreatment ◽

Thermal Chemical Vapor Deposition ◽

Polycrystalline Silicon Films

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Structural properties of polycrystalline silicon films prepared at low temperature by plasma chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.349732 ◽

1991 ◽

Vol 70 (12) ◽

pp. 7374-7381 ◽

Cited By ~ 94

Author(s):

H. Kakinuma ◽

M. Mohri ◽

M. Sakamoto ◽

T. Tsuruoka

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Structural Properties ◽

Vapor Deposition ◽

Polycrystalline Silicon ◽

Chemical Vapor ◽

Silicon Films ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Polycrystalline Silicon Films

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Continuous growth of polycrystalline silicon films by chemical vapor deposition

Journal of Crystal Growth ◽

10.1016/0022-0248(82)90449-3 ◽

1982 ◽

Vol 56 (2) ◽

pp. 313-323 ◽

Cited By ~ 3

Author(s):

Kalluri R. Sarma ◽

M. John Rice

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Polycrystalline Silicon ◽

Chemical Vapor ◽

Silicon Films ◽

Continuous Growth ◽

Polycrystalline Silicon Films

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Device-quality polycrystalline silicon films deposited at low process temperatures by hot-wire chemical vapor deposition

Thin Solid Films ◽

10.1016/s0040-6090(98)01477-1 ◽

1999 ◽

Vol 337 (1-2) ◽

pp. 248-252 ◽

Cited By ~ 7

Author(s):

S.C. Saha ◽

J. Guillet ◽

B. Equer ◽

J.E. Bourée

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Polycrystalline Silicon ◽

Chemical Vapor ◽

Silicon Films ◽

Hot Wire ◽

Polycrystalline Silicon Films

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Chemical vapor deposition of undoped and in-situ boron- and arsenic-doped epitaxial and polycrystalline silicon films grown using silane at reduced pressure

Journal of Applied Physics ◽

10.1063/1.373867 ◽

2000 ◽

Vol 88 (3) ◽

pp. 1655-1663 ◽

Cited By ~ 13

Author(s):

J. Pejnefors ◽

S.-L. Zhang ◽

H. H. Radamson ◽

J. V. Grahn ◽

M. Östling

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Polycrystalline Silicon ◽

Chemical Vapor ◽

Silicon Films ◽

Reduced Pressure ◽

Polycrystalline Silicon Films

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Synthesis of oriented and passivated polycrystalline silicon films on glass by hot wire chemical vapor deposition

2014 IEEE 40th Photovoltaic Specialist Conference (PVSC) ◽

10.1109/pvsc.2014.6925162 ◽

2014 ◽

Cited By ~ 3

Author(s):

Gurleen Kaur ◽

Md Abul Hossion ◽

Kulasekaran M ◽

Brij Mohan Arora

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Polycrystalline Silicon ◽

Chemical Vapor ◽

Silicon Films ◽

Hot Wire ◽

Polycrystalline Silicon Films

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Low Temperature Growth of Polycrystalline Silicon Films by Hot-Wire Chemical Vapor Deposition Using SiCl4/H2 Gases

Japanese Journal of Applied Physics ◽

10.1143/jjap.40.l1207 ◽

2001 ◽

Vol 40 (Part 2, No. 11B) ◽

pp. L1207-L1210 ◽

Cited By ~ 7

Author(s):

Te-Chi Wong ◽

Jih-Jen Wu

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Polycrystalline Silicon ◽

Chemical Vapor ◽

Silicon Films ◽

Hot Wire ◽

Temperature Growth ◽

Low Temperature Growth ◽

Polycrystalline Silicon Films

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Control of Preferential Orientation in Polycrystalline Silicon Films Prepared by Plasma‐Enhanced Chemical Vapor Deposition

Journal of The Electrochemical Society ◽

10.1149/1.2086285 ◽

1990 ◽

Vol 137 (11) ◽

pp. 3666-3674 ◽

Cited By ~ 15

Author(s):

S. Hasegawa ◽

S. Yamamoto ◽

Y. Kurata

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Polycrystalline Silicon ◽

Chemical Vapor ◽

Silicon Films ◽

Preferential Orientation ◽

Polycrystalline Silicon Films

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Direct growth of large grain polycrystalline silicon films on aluminum-induced crystallization seed layer using hot-wire chemical vapor deposition

Thin Solid Films ◽

10.1016/j.tsf.2012.05.009 ◽

2012 ◽

Vol 520 (18) ◽

pp. 5860-5866 ◽

Cited By ~ 22

Author(s):

Bing-Rui Wu ◽

Shih-Yung Lo ◽

Dong-Sing Wuu ◽

Sin-Liang Ou ◽

Hsin-Yuan Mao ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Seed Layer ◽

Polycrystalline Silicon ◽

Chemical Vapor ◽

Silicon Films ◽

Hot Wire ◽

Direct Growth ◽

Polycrystalline Silicon Films ◽

Induced Crystallization

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Change in crystalline morphologies of polycrystalline silicon films prepared by radio‐frequency plasma‐enhanced chemical vapor deposition using SiF4+H2gas mixture at 350 °C

Applied Physics Letters ◽

10.1063/1.111781 ◽

1994 ◽

Vol 64 (14) ◽

pp. 1865-1867 ◽

Cited By ~ 118

Author(s):

Toshiki Kaneko ◽

Masatoshi Wakagi ◽

Ken‐ichi Onisawa ◽

Tetsuroh Minemura

Keyword(s):

Chemical Vapor Deposition ◽

Radio Frequency ◽

Vapor Deposition ◽

Polycrystalline Silicon ◽

Chemical Vapor ◽

Silicon Films ◽

Radio Frequency Plasma ◽

Frequency Plasma ◽

Polycrystalline Silicon Films

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Rapid thermal chemical vapor deposition ofin situboron-doped polycrystalline silicon-germanium films on silicon dioxide for complimentary-metal-oxide-semiconductor applications

Applied Physics Letters ◽

10.1063/1.120344 ◽

1997 ◽

Vol 71 (23) ◽

pp. 3388-3390 ◽

Cited By ~ 7

Author(s):

V. Z-Q Li ◽

M. R. Mirabedini ◽

R. T. Kuehn ◽

J. J. Wortman ◽

M. C. Öztürk ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Metal Oxide ◽

Silicon Dioxide ◽

Vapor Deposition ◽

Silicon Germanium ◽

Polycrystalline Silicon ◽

Chemical Vapor ◽

Metal Oxide Semiconductor ◽

Oxide Semiconductor ◽

Thermal Chemical Vapor Deposition

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