Control of Preferential Orientation in Polycrystalline Silicon Films Prepared by Plasma‐Enhanced Chemical Vapor Deposition

1990 ◽  
Vol 137 (11) ◽  
pp. 3666-3674 ◽  
Author(s):  
S. Hasegawa ◽  
S. Yamamoto ◽  
Y. Kurata
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Polycrystalline Silicon ◽  
Chemical Vapor ◽  
Silicon Films ◽  
Preferential Orientation ◽  
Polycrystalline Silicon Films

scholarly journals P-doped polycrystalline silicon films obtained at low temperature by hot-wire chemical vapor deposition

1995 ◽  
Vol 86 (1-4) ◽  
pp. 600-603 ◽  
Author(s):  
J. Puigdollers ◽  
J. Cifre ◽  
M.C. Polo ◽  
J.M. Asensi ◽  
J. Bertomeu ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Low Temperature ◽  
Vapor Deposition ◽  
Polycrystalline Silicon ◽  
Chemical Vapor ◽  
Silicon Films ◽  
Hot Wire ◽  
Polycrystalline Silicon Films
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