Chemical vapor deposition of undoped and in-situ boron- and arsenic-doped epitaxial and polycrystalline silicon films grown using silane at reduced pressure

2000 ◽  
Vol 88 (3) ◽  
pp. 1655-1663 ◽  
Author(s):  
J. Pejnefors ◽  
S.-L. Zhang ◽  
H. H. Radamson ◽  
J. V. Grahn ◽  
M. Östling
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Polycrystalline Silicon ◽  
Chemical Vapor ◽  
Silicon Films ◽  
Reduced Pressure ◽  
Polycrystalline Silicon Films

scholarly journals P-doped polycrystalline silicon films obtained at low temperature by hot-wire chemical vapor deposition

1995 ◽  
Vol 86 (1-4) ◽  
pp. 600-603 ◽  
Author(s):  
J. Puigdollers ◽  
J. Cifre ◽  
M.C. Polo ◽  
J.M. Asensi ◽  
J. Bertomeu ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Low Temperature ◽  
Vapor Deposition ◽  
Polycrystalline Silicon ◽  
Chemical Vapor ◽  
Silicon Films ◽  
Hot Wire ◽  
Polycrystalline Silicon Films
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