Film thickness reduction of thermally annealed hydrogenated amorphous silicon prepared with plasma‐enhanced chemical vapor deposition

1994 ◽  
Vol 64 (12) ◽  
pp. 1567-1569 ◽  
Author(s):  
Y.‐K Yang ◽  
J.‐S. Shin ◽  
R.‐G. Hsieh ◽  
J.‐Y. Gan
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