scholarly journals Surface mobility and impact of precursor dosing during atomic layer deposition of platinum: in situ monitoring of nucleation and island growth

2020 ◽  
Vol 22 (43) ◽  
pp. 24917-24933 ◽  
Author(s):  
Jolien Dendooven ◽  
Michiel Van Daele ◽  
Eduardo Solano ◽  
Ranjith K. Ramachandran ◽  
Matthias M. Minjauw ◽  
...  
Keyword(s):  
Pt Nanoparticles ◽  
Particle Morphology ◽  
Atomic Layer ◽  
In Situ Monitoring ◽  
Island Growth ◽  
X Ray ◽  
Surface Mobility ◽  
Layer Deposition ◽  
And Diffusion

The nucleation rate and diffusion-driven growth of Pt nanoparticles are revealed with in situ X-ray fluorescence and scattering measurements during ALD: the particle morphology at a certain Pt loading is similar for high and low precursor exposures.

Porphyrins as Templates for Site-Selective Atomic Layer Deposition: Vapor Metalation and in Situ Monitoring of Island Growth

2016 ◽  
Vol 8 (31) ◽  
pp. 19853-19859 ◽  
Author(s):  
Jason R. Avila ◽  
Jonathan D. Emery ◽  
Michael J. Pellin ◽  
Alex B. F. Martinson ◽  
Omar K. Farha ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
In Situ Monitoring ◽  
Island Growth ◽  
Layer Deposition ◽  
Site Selective

Atomic Layer Deposition of LiF and Lithium Ion Conducting (AlF3)(LiF)x Alloys Using Trimethylaluminum, Lithium Hexamethyldisilazide and Hydrogen Fluoride

2017 ◽  
Author(s):  
Younghee Lee ◽  
Daniela M. Piper ◽  
Andrew S. Cavanagh ◽  
Matthias J. Young ◽  
Se-Hee Lee ◽  
...  
Keyword(s):  
Lithium Ion ◽  
Atomic Layer ◽  
Mass Gain ◽  
Alloy Film ◽  
Ex Situ ◽  
X Ray ◽  
Layer Deposition ◽  
Ion Conducting ◽  
Good Agreement

<div>Atomic layer deposition (ALD) of LiF and lithium ion conducting (AlF<sub>3</sub>)(LiF)<sub>x</sub> alloys was developed using trimethylaluminum, lithium hexamethyldisilazide (LiHMDS) and hydrogen fluoride derived from HF-pyridine solution. ALD of LiF was studied using in situ quartz crystal microbalance (QCM) and in situ quadrupole mass spectrometer (QMS) at reaction temperatures between 125°C and 250°C. A mass gain per cycle of 12 ng/(cm<sup>2</sup> cycle) was obtained from QCM measurements at 150°C and decreased at higher temperatures. QMS detected FSi(CH<sub>3</sub>)<sub>3</sub> as a reaction byproduct instead of HMDS at 150°C. LiF ALD showed self-limiting behavior. Ex situ measurements using X-ray reflectivity (XRR) and spectroscopic ellipsometry (SE) showed a growth rate of 0.5-0.6 Å/cycle, in good agreement with the in situ QCM measurements.</div><div>ALD of lithium ion conducting (AlF3)(LiF)x alloys was also demonstrated using in situ QCM and in situ QMS at reaction temperatures at 150°C A mass gain per sequence of 22 ng/(cm<sup>2</sup> cycle) was obtained from QCM measurements at 150°C. Ex situ measurements using XRR and SE showed a linear growth rate of 0.9 Å/sequence, in good agreement with the in situ QCM measurements. Stoichiometry between AlF<sub>3</sub> and LiF by QCM experiment was calculated to 1:2.8. XPS showed LiF film consist of lithium and fluorine. XPS also showed (AlF<sub>3</sub>)(LiF)x alloy consists of aluminum, lithium and fluorine. Carbon, oxygen, and nitrogen impurities were both below the detection limit of XPS. Grazing incidence X-ray diffraction (GIXRD) observed that LiF and (AlF<sub>3</sub>)(LiF)<sub>x</sub> alloy film have crystalline structures. Inductively coupled plasma mass spectrometry (ICP-MS) and ionic chromatography revealed atomic ratio of Li:F=1:1.1 and Al:Li:F=1:2.7: 5.4 for (AlF<sub>3</sub>)(LiF)<sub>x</sub> alloy film. These atomic ratios were consistent with the calculation from QCM experiments. Finally, lithium ion conductivity (AlF<sub>3</sub>)(LiF)<sub>x</sub> alloy film was measured as σ = 7.5 × 10<sup>-6</sup> S/cm.</div>

Optical in situ monitoring of plasma-enhanced atomic layer deposition process

2018 ◽  
Vol 57 (6S2) ◽  
pp. 06JF05 ◽  
Author(s):  
Muhammad Zeeshan Arshad ◽  
Kyung Jae Jo ◽  
Hyun Gi Kim ◽  
Sang Jeen Hong
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Deposition Process ◽  
In Situ Monitoring ◽  
Atomic Layer Deposition Process ◽  
Layer Deposition

In-Situ Synchrotron X-Ray Scattering Study of Thin Film Growth by Atomic Layer Deposition

2011 ◽  
Vol 11 (2) ◽  
pp. 1577-1580 ◽  
Author(s):  
Yong Jun Park ◽  
Dong Ryeol Lee ◽  
Hyun Hwi Lee ◽  
Han-Bo-Ram Lee ◽  
Hyungjun Kim ◽  
...  
Keyword(s):  
Thin Film ◽  
Atomic Layer Deposition ◽  
Film Growth ◽  
Atomic Layer ◽  
Thin Film Growth ◽  
X Ray ◽  
X Ray Scattering ◽  
Layer Deposition ◽  
Scattering Study

scholarly journals Ambient pressure x-ray photoelectron spectroscopy setup for synchrotron-based in situ and operando atomic layer deposition research

2022 ◽  
Vol 93 (1) ◽  
pp. 013905
Author(s):  
E. Kokkonen ◽  
M. Kaipio ◽  
H.-E. Nieminen ◽  
F. Rehman ◽  
V. Miikkulainen ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Photoelectron Spectroscopy ◽  
Ambient Pressure ◽  
Atomic Layer ◽  
X Ray ◽  
Layer Deposition

scholarly journals Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy

2020 ◽  
Vol 22 (17) ◽  
pp. 9262-9271
Author(s):  
Sofie S. T. Vandenbroucke ◽  
Elisabeth Levrau ◽  
Matthias M. Minjauw ◽  
Michiel Van Daele ◽  
Eduardo Solano ◽  
...  
Keyword(s):  
Ir Spectroscopy ◽  
Photoelectron Spectroscopy ◽  
Atomic Layer ◽  
Surface Species ◽  
X Ray ◽  
Layer Deposition ◽  
In Situ Ir ◽  
Titanium Oxide Films ◽  
In Situ Ir Spectroscopy

By the powerful combination of in situ FTIR and in vacuo XPS, the surface species during ALD of TDMAT with different reactants could be identified.

scholarly journals In situ tuning of electronic structure of catalysts using controllable hydrogen spillover for enhanced selectivity

2020 ◽  
Vol 11 (1) ◽  
Author(s):  
Mi Xiong ◽  
Zhe Gao ◽  
Peng Zhao ◽  
Guofu Wang ◽  
Wenjun Yan ◽  
...  
Keyword(s):  
Electronic Structure ◽  
Active Sites ◽  
Pt Nanoparticles ◽  
Atomic Layer ◽  
Hydrogen Spillover ◽  
General Strategy ◽  
Layer Deposition ◽  
Styrene Derivatives ◽  
Enhanced Selectivity

Abstract In situ tuning of the electronic structure of active sites is a long-standing challenge. Herein, we propose a strategy by controlling the hydrogen spillover distance to in situ tune the electronic structure. The strategy is demonstrated to be feasible with the assistance of CoOx/Al2O3/Pt catalysts prepared by atomic layer deposition in which CoOx and Pt nanoparticles are separated by hollow Al2O3 nanotubes. The strength of hydrogen spillover from Pt to CoOx can be precisely tailored by varying the Al2O3 thickness. Using CoOx/Al2O3 catalyzed styrene epoxidation as an example, the CoOx/Al2O3/Pt with 7 nm Al2O3 layer exhibits greatly enhanced selectivity (from 74.3% to 94.8%) when H2 is added. The enhanced selectivity is attributed to the introduction of controllable hydrogen spillover, resulting in the reduction of CoOx during the reaction. Our method is also effective for the epoxidation of styrene derivatives. We anticipate this method is a general strategy for other reactions.

scholarly journals In situ study of the thermal stability of supported Pt nanoparticles and their stabilization via atomic layer deposition overcoating

Nanoscale ◽  
2020 ◽  
Vol 12 (21) ◽  
pp. 11684-11693
Author(s):  
Eduardo Solano ◽  
Jolien Dendooven ◽  
Ji-Yu Feng ◽  
Philipp Brüner ◽  
Matthias M. Minjauw ◽  
...  
Keyword(s):  
Thermal Stability ◽  
Atomic Layer Deposition ◽  
Pt Nanoparticles ◽  
Atomic Layer ◽  
Pt Nanoparticle ◽  
In Situ Study ◽  
Layer Deposition ◽  
Nanoparticle Stabilization ◽  
Thermal Stability Of

Supported Pt nanoparticle stabilization via Atomic Layer Deposition overcoating with Al2O3 has been proved to prevent particle coarsening during thermal annealing for widely spaced nanoparticles while ensuring surface accessibility for applications.

In situ synchrotron x-ray characterization of ZnO atomic layer deposition

2010 ◽  
Vol 97 (19) ◽  
pp. 191904 ◽  
Author(s):  
D. D. Fong ◽  
J. A. Eastman ◽  
S. K. Kim ◽  
T. T. Fister ◽  
M. J. Highland ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
X Ray ◽  
Layer Deposition
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