Porphyrins as Templates for Site-Selective Atomic Layer Deposition: Vapor Metalation and in Situ Monitoring of Island Growth

2016 ◽  
Vol 8 (31) ◽  
pp. 19853-19859 ◽  
Author(s):  
Jason R. Avila ◽  
Jonathan D. Emery ◽  
Michael J. Pellin ◽  
Alex B. F. Martinson ◽  
Omar K. Farha ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
In Situ Monitoring ◽  
Island Growth ◽  
Layer Deposition ◽  
Site Selective

Optical in situ monitoring of plasma-enhanced atomic layer deposition process

2018 ◽  
Vol 57 (6S2) ◽  
pp. 06JF05 ◽  
Author(s):  
Muhammad Zeeshan Arshad ◽  
Kyung Jae Jo ◽  
Hyun Gi Kim ◽  
Sang Jeen Hong
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Deposition Process ◽  
In Situ Monitoring ◽  
Atomic Layer Deposition Process ◽  
Layer Deposition

scholarly journals Surface mobility and impact of precursor dosing during atomic layer deposition of platinum: in situ monitoring of nucleation and island growth

2020 ◽  
Vol 22 (43) ◽  
pp. 24917-24933 ◽  
Author(s):  
Jolien Dendooven ◽  
Michiel Van Daele ◽  
Eduardo Solano ◽  
Ranjith K. Ramachandran ◽  
Matthias M. Minjauw ◽  
...  
Keyword(s):  
Pt Nanoparticles ◽  
Particle Morphology ◽  
Atomic Layer ◽  
In Situ Monitoring ◽  
Island Growth ◽  
X Ray ◽  
Surface Mobility ◽  
Layer Deposition ◽  
And Diffusion

The nucleation rate and diffusion-driven growth of Pt nanoparticles are revealed with in situ X-ray fluorescence and scattering measurements during ALD: the particle morphology at a certain Pt loading is similar for high and low precursor exposures.

In Situ Monitoring of Hafnium Oxide Atomic Layer Deposition

2007 ◽  
Author(s):  
J. E. Maslar ◽  
W. S. Hurst ◽  
D. R. Burgess ◽  
W. A. Kimes ◽  
N. V. Nguyen ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Hafnium Oxide ◽  
Atomic Layer ◽  
In Situ Monitoring ◽  
Layer Deposition

scholarly journals Structural and Optical Properties of Luminescent Copper(I) Chloride Thin Films Deposited by Sequentially Pulsed Chemical Vapour Deposition

Coatings ◽  
2018 ◽  
Vol 8 (10) ◽  
pp. 369 ◽  
Author(s):  
Richard Krumpolec ◽  
Tomáš Homola ◽  
David Cameron ◽  
Josef Humlíček ◽  
Ondřej Caha ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Chemical Vapour Deposition ◽  
Photoelectron Spectroscopy ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Atomic Layer ◽  
Nanocrystalline Films ◽  
Zinc Blende ◽  
Layer Deposition

Sequentially pulsed chemical vapour deposition was used to successfully deposit thin nanocrystalline films of copper(I) chloride using an atomic layer deposition system in order to investigate their application to UV optoelectronics. The films were deposited at 125 °C using [Bis(trimethylsilyl)acetylene](hexafluoroacetylacetonato)copper(I) as a Cu precursor and pyridine hydrochloride as a new Cl precursor. The films were analysed by XRD, X-ray photoelectron spectroscopy (XPS), SEM, photoluminescence, and spectroscopic reflectance. Capping layers of aluminium oxide were deposited in situ by ALD (atomic layer deposition) to avoid environmental degradation. The film adopted a polycrystalline zinc blende-structure. The main contaminants were found to be organic materials from the precursor. Photoluminescence showed the characteristic free and bound exciton emissions from CuCl and the characteristic exciton absorption peaks could also be detected by reflectance measurements.

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