High Index Resist for 193 nm Immersion Lithography

2008 ◽  
Vol 41 (15) ◽  
pp. 5674-5680 ◽  
Author(s):  
Kazuya Matsumoto ◽  
Elizabeth A. Costner ◽  
Isao Nishimura ◽  
Mitsuru Ueda ◽  
C. Grant Willson
Keyword(s):  
High Index ◽  
Immersion Lithography ◽  
193 Nm

scholarly journals Novel high-index resists for 193-nm immersion lithography and beyond

2007 ◽  
Author(s):  
Idriss Blakey ◽  
Lan Chen ◽  
Bronwin Dargaville ◽  
Heping Liu ◽  
Andrew Whittaker ◽  
...  
Keyword(s):  
High Index ◽  
Immersion Lithography ◽  
193 Nm

High-index resist for 193-nm immersion lithography

2008 ◽  
Author(s):  
Kazuya Matsumoto ◽  
Elizabeth Costner ◽  
Isao Nishimura ◽  
Mitsuru Ueda ◽  
C. Grant Willson
Keyword(s):  
High Index ◽  
Immersion Lithography ◽  
193 Nm

scholarly journals High index 193 nm immersion lithography: the beginning or the end of the road

2009 ◽  
Author(s):  
Paul A. Zimmerman ◽  
Bryan J. Rice ◽  
Emil C. Piscani ◽  
Vladimir Liberman
Keyword(s):  
High Index ◽  
The Road ◽  
Immersion Lithography ◽  
193 Nm

High-index materials for 193 nm immersion lithography

2005 ◽  
Author(s):  
John H. Burnett ◽  
Simon G. Kaplan ◽  
Eric L. Shirley ◽  
Paul J. Tompkins ◽  
James E. Webb
Keyword(s):  
High Index ◽  
Immersion Lithography ◽  
193 Nm

High-index fluoride materials for 193-nm immersion lithography

2007 ◽  
Author(s):  
Teruhiko Nawata ◽  
Yoji Inui ◽  
Isao Masada ◽  
Eiichi Nishijima ◽  
Toshiro Mabuchi ◽  
...  
Keyword(s):  
High Index ◽  
Immersion Lithography ◽  
193 Nm

Feasibility of 37-nm half-pitch with ArF high-index immersion lithography

2007 ◽  
Author(s):  
Yoshiyuki Sekine ◽  
Miyoko Kawashima ◽  
Eiji Sakamoto ◽  
Keita Sakai ◽  
Akihiro Yamada ◽  
...  
Keyword(s):  
High Index ◽  
Immersion Lithography

6 kHz MOPA light source for 193 nm immersion lithography

2005 ◽  
Author(s):  
Walter D. Gillespie ◽  
Toshihiko Ishihara ◽  
William N. Partlo ◽  
George X. Ferguson ◽  
Michael R. Simon
Keyword(s):  
Light Source ◽  
Immersion Lithography ◽  
193 Nm

Current status of high-index immersion lithography development

2007 ◽  
Author(s):  
Yasuhiro Ohmura ◽  
Toshiharu Nakashima ◽  
Hiroyuki Nagasaka ◽  
Ayako Sukegawa ◽  
Satoshi Ishiyama ◽  
...  
Keyword(s):  
High Index ◽  
Current Status ◽  
Immersion Lithography

Implications of immersion lithography on 193-nm photoresists

2004 ◽  
Author(s):  
J. Christopher Taylor ◽  
Charles R. Chambers ◽  
Ryan Deschner ◽  
Robert J. LeSuer ◽  
Willard E. Conley ◽  
...  
Keyword(s):  
Immersion Lithography ◽  
193 Nm

New high-index fluids for immersion lithography

2006 ◽  
Author(s):  
Elizabeth Costner ◽  
J. Christopher Taylor ◽  
Stefan Caporale ◽  
William Wojtczak ◽  
Dean Dewulf ◽  
...  
Keyword(s):  
High Index ◽  
Immersion Lithography
Sign in / Sign up

Export Citation Format

Share Document