Spatially Resolved Imaging of Inhomogeneous Charge Transfer Behavior in Polymorphous Molybdenum Oxide. I. Correlation of Localized Structural, Electronic, and Chemical Properties Using Conductive Probe Atomic Force Microscopy and Raman Microprobe Spectroscopy

Langmuir ◽  
2005 ◽  
Vol 21 (8) ◽  
pp. 3521-3528 ◽  
Author(s):  
Todd M. McEvoy ◽  
Keith J. Stevenson
Keyword(s):  
Atomic Force Microscopy ◽  
Charge Transfer ◽  
Molybdenum Oxide ◽  
Chemical Properties ◽  
Force Microscopy ◽  
Spatially Resolved ◽  
Atomic Force ◽  
Raman Microprobe ◽  
Transfer Behavior ◽  
And Chemical Properties

Infrared Characterization of PMMA-SiO2 Hybrid Glasses Obtained by Sol-Gel Process

2010 ◽  
Vol 1278 ◽  
Author(s):  
L.L. Díaz-Flores ◽  
A. S. López Rodríguez ◽  
P. SifuentesGallardo ◽  
M.A. Hernàndez Rivera ◽  
M.a Garnica Romo ◽  
...  
Keyword(s):  
Sol Gel ◽  
Chemical Properties ◽  
Hybrid Coatings ◽  
Force Microscopy ◽  
Air Atmosphere ◽  
Atomic Force ◽  
Sol Gel Process ◽  
Traditional Process ◽  
And Chemical Properties

AbstractThis work is about the production of hybrid coatings of the system SiO2-PMMA (PMMA, polymethylmethacrylate). These materials have interesting mechanical and chemical properties useful for anticorrosive and wear resistance applications. SiO2-PMMA hybrids were obtained by the sol-gel traditional process, using tetraethylorthosilicate (TEOS) and methylmethacrylate (MMA) by Aldrich Co, as starting reagents. The SiO2:PMMA ratio was varied from 0:1 to about 1:1 at air atmosphere deposition. The coatings were obtained on acrylic sheets and silicon wafers. A diversity of coatings with chemical composition ranging from SiO2 and PMMA to obtain the SiO2-PMMA hybrids were obtained. Infrared (IR) and atomic force microscopy (AFM), were performed to determinate structural and morphological behavior.

Spatially resolved electrical measurements of SiO2 gate oxides using atomic force microscopy

1993 ◽  
Vol 62 (7) ◽  
pp. 786-788 ◽  
Author(s):  
M. P. Murrell ◽  
M. E. Welland ◽  
S. J. O’Shea ◽  
T. M. H. Wong ◽  
J. R. Barnes ◽  
...  
Keyword(s):  
Atomic Force Microscopy ◽  
Electrical Measurements ◽  
Gate Oxides ◽  
Force Microscopy ◽  
Spatially Resolved ◽  
Atomic Force
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