Suppression of Forward Electron Injection from Ru(dcbpy)2(NCS)2 to Nanocrystalline TiO2 Film As a Result of an Interfacial Al2O3 Barrier Layer Prepared with Atomic Layer Deposition

2009 ◽  
Vol 1 (2) ◽  
pp. 536-539 ◽  
Author(s):  
Liisa J. Antila ◽  
Mikko J. Heikkilä ◽  
Viivi Aumanen ◽  
Marianna Kemell ◽  
Pasi Myllyperkiö ◽  
...  
2002 ◽  
Vol 81 (15) ◽  
pp. 2824-2826 ◽  
Author(s):  
Anri Nakajima ◽  
Toshirou Kidera ◽  
Hiroyuki Ishii ◽  
Shin Yokoyama

2017 ◽  
Vol 46 (32) ◽  
pp. 10734-10741 ◽  
Author(s):  
Yajun Wang ◽  
Weikun Bai ◽  
Haiquan Wang ◽  
Yao Jiang ◽  
Shanlei Han ◽  
...  

The introduction of an Al2O3 recombination barrier layer at the interface between TiO2 and CdSe can effectively improve the PEC hydrogen evolution performance.


2012 ◽  
Vol 521 ◽  
pp. 146-149 ◽  
Author(s):  
Dae-Yong Moon ◽  
Dong-Suk Han ◽  
Jae-Hyung Park ◽  
Sae-Young Shin ◽  
Jong-Wan Park ◽  
...  

2016 ◽  
Vol 23 (9) ◽  
Author(s):  
Javed Alam ◽  
Mansour Alhoshan ◽  
Lawrence Arockiasamy Dass ◽  
Arun Kumar Shukla ◽  
M. R. Muthumareeswaran ◽  
...  

Nanoscale ◽  
2015 ◽  
Vol 7 (29) ◽  
pp. 12266-12283 ◽  
Author(s):  
Axel F. Palmstrom ◽  
Pralay K. Santra ◽  
Stacey F. Bent

This review highlights applications of atomic layer deposition for third generation photovoltaics, including light absorption, barrier layer formation and passivation.


2002 ◽  
Author(s):  
Hiroyuki Ishii ◽  
Toshirou Kidera ◽  
Anri Nakajima ◽  
Shin Yokoyama

2007 ◽  
Vol 91 (24) ◽  
pp. 242903 ◽  
Author(s):  
Liang Sun ◽  
Yuan Xue ◽  
Shi-Jin Ding ◽  
Hao-Wen Guo ◽  
David Wei Zhang ◽  
...  

2007 ◽  
Vol 154 (2) ◽  
pp. G44 ◽  
Author(s):  
Martin M. Frank ◽  
Yu Wang ◽  
Ming-Tsung Ho ◽  
Rhett T. Brewer ◽  
Naim Moumen ◽  
...  

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