Temperature-Dependent Properties of nc-Si Thin Films Synthesized in Low-Pressure, Thermally Nonequilibrium, High-Density Inductively Coupled Plasmas

2009 ◽  
Vol 113 (33) ◽  
pp. 14759-14764 ◽  
Author(s):  
Qijin Cheng ◽  
Shuyan Xu ◽  
Kostya (Ken) Ostrikov
Keyword(s):  
Thin Films ◽  
Low Pressure ◽  
High Density ◽  
Inductively Coupled Plasmas ◽  
Temperature Dependent ◽  
Inductively Coupled ◽  
Temperature Dependent Properties ◽  
Coupled Plasmas

Etching characteristics of ZnO thin films in chlorine-containing inductively coupled plasmas

2006 ◽  
Vol 83 (2) ◽  
pp. 328-335 ◽  
Author(s):  
S.W. Na ◽  
M.H. Shin ◽  
Y.M. Chung ◽  
J.G. Han ◽  
S.H. Jeung ◽  
...  
Keyword(s):  
Thin Films ◽  
Zno Thin Films ◽  
Inductively Coupled Plasmas ◽  
Inductively Coupled ◽  
Coupled Plasmas

Advanced selective dry etching of GaAs/AlGaAs in high density inductively coupled plasmas

2000 ◽  
Vol 18 (4) ◽  
pp. 1220-1224 ◽  
Author(s):  
J. W. Lee ◽  
M. W. Devre ◽  
B. H. Reelfs ◽  
D. Johnson ◽  
J. N. Sasserath ◽  
...  
Keyword(s):  
Dry Etching ◽  
High Density ◽  
Inductively Coupled Plasmas ◽  
Inductively Coupled ◽  
Coupled Plasmas
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