Evolution of nanocrystalline diamond thin films by high-density low-pressure CH4 plasma in planar inductively coupled plasma CVD

2020 ◽  
Author(s):  
Sucharita Saha ◽  
Debajyoti Das
Keyword(s):  
Thin Films ◽  
Inductively Coupled Plasma ◽  
Low Pressure ◽  
High Density ◽  
Nanocrystalline Diamond ◽  
Plasma Cvd ◽  
Inductively Coupled ◽  
Diamond Thin Films

Rapid synthesis of nc-Si/a-SiNx:H QD thin films by plasma processing for their cost effective applications in photonic and photovoltaic devices

RSC Advances ◽  
2015 ◽  
Vol 5 (78) ◽  
pp. 63572-63579 ◽  
Author(s):  
Debajyoti Das ◽  
Basudeb Sain
Keyword(s):  
Thin Films ◽  
Inductively Coupled Plasma ◽  
Plasma Processing ◽  
Cost Effective ◽  
Single Step ◽  
High Density ◽  
Gas Mixture ◽  
Photovoltaic Devices ◽  
Rapid Synthesis ◽  
Inductively Coupled

A rapid and single step synthesis of nc-Si/a-SiNx:H QD thin films has been made possible from a (SiH4 + NH3) gas mixture, with the advent of high density low pressure planar inductively coupled plasma processing.

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