Synthesis and evaluation of copolymers of (tert-butoxycarbonyloxy)styrene and (2-nitrobenzyl)styrene sulfonates: single-component chemically amplified deep-UV imaging materials

1992 ◽  
Vol 4 (4) ◽  
pp. 837-842 ◽  
Author(s):  
J. E. Hanson ◽  
E. Reichmanis ◽  
F. M. Houlihan ◽  
T. X. Neenan
Keyword(s):  
Single Component ◽  
Uv Imaging ◽  
Chemically Amplified ◽  
Deep Uv

Single-component chemically amplified resist materials for electron-beam and x-ray lithography

1991 ◽  
Author(s):  
Anthony E. Novembre ◽  
Woon W. Tai ◽  
Janet M. Kometani ◽  
James E. Hanson ◽  
Omkaram Nalamasu ◽  
...  
Keyword(s):  
Electron Beam ◽  
Single Component ◽  
X Ray ◽  
Chemically Amplified ◽  
Chemically Amplified Resist

Deep UV Imaging of Galaxies in the Fornax Cluster

1996 ◽  
Vol 112 ◽  
pp. 431 ◽  
Author(s):  
Karen O'Neil ◽  
G. D. Bothun ◽  
Eric P. Smith ◽  
T. P. Stecher
Keyword(s):  
Uv Imaging ◽  
Deep Uv ◽  
Fornax Cluster

First demonstration and performance of AlGaN based focal plane array for deep-UV imaging

2009 ◽  
Author(s):  
J.-L. Reverchon ◽  
S. Bansropun ◽  
J. A. Robo ◽  
J. P. Truffer ◽  
E. Costard ◽  
...  
Keyword(s):  
Focal Plane ◽  
Focal Plane Array ◽  
Uv Imaging ◽  
Deep Uv ◽  
And Performance

Comparison of the lithographic characteristics of t-BOC-based chemically amplified resist system under deep-UV and electron-beam exposures

1994 ◽  
Author(s):  
Regine G. Tarascon-Auriol ◽  
Anthony E. Novembre ◽  
Woon W. Tai ◽  
Linus A. Fetter ◽  
Janet M. Kometani ◽  
...  
Keyword(s):  
Electron Beam ◽  
Chemically Amplified ◽  
Chemically Amplified Resist ◽  
Deep Uv

Quarter- and subquarter-micron deep-UV lithography with chemically amplified positive resist

1996 ◽  
Author(s):  
Yasunobu Onishi ◽  
Kazuo Sato ◽  
Kenzi Chiba ◽  
Masafumi Asano ◽  
Hirokazu Niki ◽  
...  
Keyword(s):  
Uv Lithography ◽  
Chemically Amplified ◽  
Deep Uv ◽  
Positive Resist

Label-free multi-spectral deep UV imaging of prostate cancer tissue

2021 ◽  
Author(s):  
Soheil Soltani ◽  
Ashkan Ojaghi ◽  
Adeboye O. Osunkoya ◽  
Francisco E. Robles
Keyword(s):  
Prostate Cancer ◽  
Cancer Tissue ◽  
Label Free ◽  
Uv Imaging ◽  
Prostate Cancer Tissue ◽  
Deep Uv

Delay-time stable chemically amplified deep-UV resist

1993 ◽  
Author(s):  
Klaus J. Przybilla ◽  
Yoshiaki Kinoshita ◽  
Takanori Kudo ◽  
Seiya Masuda ◽  
Hiroshi Okazaki ◽  
...  
Keyword(s):  
Delay Time ◽  
Chemically Amplified ◽  
Deep Uv

A novel chemically amplified positive deep UV photoresist with significantly reduced sensitivity to environmental contamination

1992 ◽  
Vol 32 (21) ◽  
pp. 1571-1577 ◽  
Author(s):  
Subhankar Chatterjee ◽  
Sangya Jain ◽  
Ping H. Lu ◽  
Dinesh N. Khanna ◽  
Robert E. Potvin ◽  
...  
Keyword(s):  
Environmental Contamination ◽  
Chemically Amplified ◽  
Deep Uv

Deep-UV positive-tone dry-development process using chemically amplified resist and its application to 256 Mbit DRAM

1993 ◽  
Author(s):  
Woo-Sung Han ◽  
Joong-Hyun Lee ◽  
Jung-Chul Park ◽  
Choon-Geun Park ◽  
Hoyoung Kang ◽  
...  
Keyword(s):  
Development Process ◽  
Chemically Amplified ◽  
Chemically Amplified Resist ◽  
Deep Uv
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