Supercritical Carbon Dioxide Enables Rapid, Clean, and Scalable Conversion of a Metal Oxide into Zeolitic Metal–Organic Frameworks

2018 ◽  
Vol 18 (5) ◽  
pp. 3222-3228 ◽  
Author(s):  
Joseph M. Marrett ◽  
Cristina Mottillo ◽  
Simon Girard ◽  
Christopher W. Nickels ◽  
Jean-Louis Do ◽  
...  
Keyword(s):  
Carbon Dioxide ◽  
Supercritical Carbon Dioxide ◽  
Metal Oxide ◽  
Metal Organic Frameworks ◽  
Metal Organic ◽  
Supercritical Carbon

Supercritical carbon dioxide-assisted drug loading and release from biocompatible porous metal–organic frameworks

2014 ◽  
Vol 2 (43) ◽  
pp. 7551-7558 ◽  
Author(s):  
Kiyoshi Matsuyama ◽  
Nobukatsu Hayashi ◽  
Misaki Yokomizo ◽  
Takafumi Kato ◽  
Kiyomi Ohara ◽  
...  
Keyword(s):  
Carbon Dioxide ◽  
Controlled Release ◽  
Supercritical Carbon Dioxide ◽  
Drug Loading ◽  
Metal Organic Frameworks ◽  
Porous Metal ◽  
Porous Iron ◽  
Metal Organic ◽  
Supercritical Carbon

The scCO2-assisted loading of ibuprofen on nontoxic and biocompatible porous iron(iii) polycarboxylate metal–organic frameworks (MOFs) demonstrated high guest loading and controlled release of these materials.

Supercritical-carbon dioxide-assisted cyclic deposition of metal oxide and metal thin films

2006 ◽  
Vol 88 (9) ◽  
pp. 092904 ◽  
Author(s):  
Dipak Barua ◽  
Theodosia Gougousi ◽  
Erin D. Young ◽  
Gregory N. Parsons
Keyword(s):  
Thin Films ◽  
Carbon Dioxide ◽  
Supercritical Carbon Dioxide ◽  
Metal Oxide ◽  
Metal Thin Films ◽  
Supercritical Carbon

Low-Temperature Processing of Sol-Gel Derived Metal Oxide Thin Films using Supercritical Carbon Dioxide Fluid

2008 ◽  
Vol 1113 ◽  
Author(s):  
Hiroshi Uchida ◽  
Kaori Fujioka ◽  
Seiichiro Koda
Keyword(s):  
Thin Films ◽  
Carbon Dioxide ◽  
Supercritical Carbon Dioxide ◽  
Metal Oxide ◽  
Substrate Temperature ◽  
Sol Gel ◽  
Processing Temperature ◽  
Oxide Thin Films ◽  
Metal Oxide Thin Films ◽  
Supercritical Carbon

ABSTRACTWe demonstrate a novel technique using supercritical carbon dioxide (scCO2) fluid for lowering processing temperature of sol-gel-derived metal oxide thin films. The film processing was performed in a hot-wall closed vessel filled with scCO2 fluid. The effects of fluid temperature and additives on the sol-gel synthesis reaction under scCO2 fluid were also investigated. Precursor films of titanium dioxide (TiO2) prepared on silicon wafer and silica glass by sol-gel coating using Ti-alkoxide were converted to crystalline TiO2 (anatase) films successfully by treatment in scCO2 without additive agent at a fluid pressure of 15 MPa and at a substrate temperature of above 250°C, which is significantly lower than the processing temperature of conventional sol-gel deposition. Furthermore, additive agents such as water (H2O) and nitrogen-oxygen mixture (N2-O2) promoted the decomposition and crystallization of precursor films in scCO2 fluid to form the crystalline TiO2 (anatase) films at a substrate temperature at as low as 200°C although it also produced surface absorbates consisted of hydroxides on the film surface. The experimental results suggested that the hydrolysis and polymerization reactions of Ti-alkoxide in the precursor films were proceeded by the scCO2 processing to form titanium-oxygen (Ti-O) networks and that byproducts such as alcohols were removed from the resulting films.

scholarly journals Low Temperature Deposition of Metal Oxide Thin Films in Supercritical Carbon Dioxide Using Metal-organic Precursors

2007 ◽  
Vol 1007 ◽  
Author(s):  
Theodosia Gougousi ◽  
Zhiying Chen
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Carbon Dioxide ◽  
Supercritical Carbon Dioxide ◽  
Low Temperatures ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Metal Organic ◽  
Organic Precursors ◽  
Supercritical Carbon

ABSTRACTA novel chemical route in thin film formation that includes the use of inorganic and organic peroxides and metal organic complexes soluble in supercritical carbon dioxide has been investigated for the deposition of alumina, titania and zirconia thin films at low temperatures (<150°C). The metal organic precursors used include: Al(acac)3, OTi(tmhd)2, and Zr(acac)4. Tert-butyl peroxide, and a 30% aqueous solution of hydrogen peroxide were used as oxidants. Depositions were carried out in a 25 ml hot wall reactor at pressures ranging from 2100 to 3900 psi at 80-140°C. The deposited thin films were investigated by using X-ray photoelectron spectroscopy (XPS) and transmission Fourier transform infrared spectroscopy (FTIR). XPS and FTIR results indicate the formation of metal oxides thin films with some bonded carbon. The deposition temperatures achieved in this process are substantially lower than those used in conventional vacuum deposition techniques making feasible the deposition on temperature sensitive substrates and organic materials required for the development of hybrid organic/inorganic devices. Processing at low temperatures in supercritical carbon dioxide may provide the basis for the development of an alternative, environmentally friendly, thin film deposition technique for the processing of nanostructures.

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