Characteristics and thermal stability of MOS devices with MoN/TiN and TiN/MoN metal gate stacks

2008 ◽  
Vol 52 (10) ◽  
pp. 1512-1517 ◽  
Author(s):  
Chung-Hao Fu ◽  
Po-Yen Chien ◽  
Kuei-Shu Chang-Liao ◽  
Tien-Ko Wang ◽  
Wen-Fa Wu
Keyword(s):  
Thermal Stability ◽  
Gate Stacks ◽  
Metal Gate ◽  
Mos Devices ◽  
Thermal Stability Of

Thermal stability of Hf/sub x/Ta/sub y/N metal gate electrodes for advanced MOS devices

2006 ◽  
Vol 27 (3) ◽  
pp. 148-150 ◽  
Author(s):  
Chin-Lung Cheng ◽  
Kuei-Shu Chang-Liao ◽  
Tzu-Chen Wang ◽  
Tien-Ko Wang ◽  
Howard Chih-Hao Wang
Keyword(s):  
Thermal Stability ◽  
Metal Gate Electrodes ◽  
Metal Gate ◽  
Gate Electrodes ◽  
Mos Devices ◽  
Thermal Stability Of

Electrical Characteristics and Thermal Stability of $ \hbox{Hf}_{x}\hbox{Ta}_{y}\hbox{Si}_{z}\hbox{N}$ Metal Gate Electrode for Advanced MOS Devices

2008 ◽  
Vol 55 (11) ◽  
pp. 3259-3266
Author(s):  
Chang-Ta Yang ◽  
Kuei-Shu Chang-Liao ◽  
Hsin-Chun Chang ◽  
Chung-Hao Fu ◽  
Tien-Ko Wang ◽  
...  
Keyword(s):  
Thermal Stability ◽  
Electrical Characteristics ◽  
Gate Electrode ◽  
Metal Gate ◽  
Mos Devices ◽  
Thermal Stability Of

Work function and thermal stability of Ti1−xAlxNy for dual metal gate electrodes

2002 ◽  
Vol 81 (22) ◽  
pp. 4192-4194 ◽  
Author(s):  
Tae-Ho Cha ◽  
Dae-Gyu Park ◽  
Tae-Kyun Kim ◽  
Se-Aug Jang ◽  
In-Seok Yeo ◽  
...  
Keyword(s):  
Thermal Stability ◽  
Work Function ◽  
Metal Gate Electrodes ◽  
Metal Gate ◽  
Gate Electrodes ◽  
Dual Metal ◽  
Thermal Stability Of

Thermal Stability of Sputtered TiN as Metal Gate on 4H-SiC

1998 ◽  
Vol 264-268 ◽  
pp. 805-808 ◽  
Author(s):  
Erik Danielsson ◽  
Chris I. Harris ◽  
Carl Mikael Zetterling ◽  
Mikael Östling
Keyword(s):  
Thermal Stability ◽  
Metal Gate ◽  
Thermal Stability Of
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