Reliability and Thermal Stability of Clustered Vertical Furnace-Grown $\hbox{SiO}_{2}$ With $\hbox{Hf}_{\rm x}\hbox{Ta}_{\rm y}\hbox{N}$ Metal Gate for Advanced MOS Device Application
Keyword(s):
Keyword(s):
2006 ◽
Vol 27
(3)
◽
pp. 148-150
◽
Keyword(s):
1998 ◽
Vol 264-268
◽
pp. 805-808
◽
2008 ◽
Vol 52
(10)
◽
pp. 1512-1517
◽
1998 ◽
Vol 16
(4)
◽
pp. 2154
◽
Keyword(s):
Keyword(s):