In-situ low-energy background measurement in D2O+salt phase of the Sudbury Neutrino Observatory, using the isotropy of β-γ Čerenkov light

2005 ◽  
Vol 138 ◽  
pp. 533-535
Author(s):  
S.J.M. Peeters
Keyword(s):  
Low Energy ◽  
Sudbury Neutrino Observatory ◽  
Background Measurement ◽  
Salt Phase ◽  
Cerenkov Light

Study of scalable IBS nanopatterning mechanisms for III-V semiconductors using in-situ surface characterization

2011 ◽  
Vol 1354 ◽  
Author(s):  
Jean Paul Allain ◽  
Osman El-Atwani ◽  
Alex Cimaroli ◽  
Daniel L. Rokusek ◽  
Sami Ortoleva ◽  
...  
Keyword(s):  
Surface Chemistry ◽  
Surface Characterization ◽  
Ion Irradiation ◽  
Ion Beam ◽  
Low Energy ◽  
Self Organization ◽  
Beam Parameter ◽  
Ion Beam Sputtering

ABSTRACTIon-beam sputtering (IBS) has been studied as a means for scalable, mask-less nanopatterning of surfaces. Patterning at the nanoscale has been achieved for numerous types of materials including: semiconductors, metals and insulators. Although much work has been focused on tailoring nanopatterning by systematic ion-beam parameter manipulation, limited work has addressed elucidating on the underlying mechanisms for self-organization of multi-component surfaces. In particular there has been little attention to correlate the surface chemistry variation during ion irradiation with the evolution of surface morphology and nanoscale self-organization. Moreover the role of surface impurities on patterning is not well known and characterization during the time-scale of modification remains challenging. This work summarizes an in-situ approach to characterize the evolution of surface chemistry during irradiation and its correlation to surface nanopatterning for a variety of multi-components surfaces. The work highlights the importance and role of surface impurities in nanopatterning of a surface during low-energy ion irradiation. In particular, it shows the importance of irradiation-driven mechanisms in GaSb(100) nanopatterning by low-energy ions and how the study of these systems can be impacted by oxide formation.

High Quality Epitaxial Growth on in-Situ Patterned Inp Substrates

1989 ◽  
Vol 145 ◽  
Author(s):  
H. Temkin ◽  
L. R. Harriott ◽  
J. Weiner ◽  
R. A. Hamm ◽  
M. B. Panish
Keyword(s):  
Epitaxial Growth ◽  
Ion Beam ◽  
Low Energy ◽  
High Quality ◽  
Lithography Process ◽  
Luminescence Efficiency ◽  
Surface Steps ◽  
Inp Substrates ◽  
Vacuum Lithography

AbstractWe demonstrate a vacuum lithography process which uses a finely focused Ga ion beam to write the pattern which is then transferred to the InP pattern by low energy dry etching. Surface steps on the order of 1000-2000A in height, and lateral resolution limited only by size of the ion beam, can be efficiently prepared using moderate Ga ion fluences. The surfaces prepared by this process are damage free and suitable for epitaxial overgrowth. GaInAs/InP heterostructures grown on in-situ patterned substrates show excellent morphology and high luminescence efficiency.

scholarly journals In-situ Low Energy Argon Ion Source for Artifact Free High Resolution STEM Imaging

2019 ◽  
Vol 25 (S2) ◽  
pp. 548-549
Author(s):  
Mikhail Dutka ◽  
Romaine Isaacs ◽  
Anna Prokhodtseva ◽  
Tomáš Vystavěl
Keyword(s):  
High Resolution ◽  
Ion Source ◽  
Low Energy ◽  
Argon Ion

In situ investigation of phase formation during low energy ion nitriding of Ni80Cr20 alloy

2014 ◽  
Vol 259 ◽  
pp. 434-441 ◽  
Author(s):  
D. Manova ◽  
D. Hirsch ◽  
J.W. Gerlach ◽  
S. Mändl ◽  
H. Neumann ◽  
...  
Keyword(s):  
Phase Formation ◽  
Low Energy ◽  
Ion Nitriding ◽  
In Situ Investigation

In situ observations of Ge(001) and Ge/Si(001) using low‐energy ion scattering

1994 ◽  
Vol 12 (6) ◽  
pp. 3012-3017 ◽  
Author(s):  
W. T. Taferner ◽  
A. Freundlich ◽  
A. Bensaoula ◽  
A. Ignatiev ◽  
Kelley Waters ◽  
...  
Keyword(s):  
Low Energy ◽  
Ion Scattering ◽  
Low Energy Ion Scattering ◽  
In Situ Observations
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