Use of very low energy in situ focused ion beams for three-dimensional dopant patterning during molecular beam epitaxial growth

Author(s):  
P. J. A. Sazio
APL Materials ◽  
2020 ◽  
Vol 8 (10) ◽  
pp. 101107
Author(s):  
Xi Yan ◽  
Friederike Wrobel ◽  
Yan Li ◽  
Hua Zhou ◽  
Huan-hua Wang ◽  
...  

1995 ◽  
Vol 24 (5) ◽  
pp. 685-690 ◽  
Author(s):  
Zhonghai Yu ◽  
M. A. Mattson ◽  
T. H. Myers ◽  
K. A. Harris ◽  
R. W. Yanka ◽  
...  

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